TU Darmstadt / ULB / TUbiblio

Physical properties and band structure of reactive molecular beam epitaxy grown oxygen engineered HfO[sub 2±x]

Hildebrandt, Erwin ; Kurian, Jose ; Alff, Lambert (2012)
Physical properties and band structure of reactive molecular beam epitaxy grown oxygen engineered HfO[sub 2±x].
In: Journal of Applied Physics, 112 (11)
doi: 10.1063/1.4767379
Artikel, Bibliographie

Kurzbeschreibung (Abstract)

We have conducted a detailed thin film growth structure of oxygen engineered monoclinic HfO2±x grown by reactive molecular beam epitaxy. The oxidation conditions induce a switching between (1¯11) and (002) texture of hafnium oxide. The band gap of oxygen deficient hafnia decreases with increasing amount of oxygen vacancies by more than 1 eV. For high oxygen vacancy concentrations, defect bands form inside the band gap that induce optical transitions and p-type conductivity. The resistivity changes by several orders of magnitude as a function of oxidation conditions. Oxygen vacancies do not give rise to ferromagnetic behavior.

Typ des Eintrags: Artikel
Erschienen: 2012
Autor(en): Hildebrandt, Erwin ; Kurian, Jose ; Alff, Lambert
Art des Eintrags: Bibliographie
Titel: Physical properties and band structure of reactive molecular beam epitaxy grown oxygen engineered HfO[sub 2±x]
Sprache: Englisch
Publikationsjahr: 6 Dezember 2012
Verlag: AIP Publishing LLC
Titel der Zeitschrift, Zeitung oder Schriftenreihe: Journal of Applied Physics
Jahrgang/Volume einer Zeitschrift: 112
(Heft-)Nummer: 11
DOI: 10.1063/1.4767379
Kurzbeschreibung (Abstract):

We have conducted a detailed thin film growth structure of oxygen engineered monoclinic HfO2±x grown by reactive molecular beam epitaxy. The oxidation conditions induce a switching between (1¯11) and (002) texture of hafnium oxide. The band gap of oxygen deficient hafnia decreases with increasing amount of oxygen vacancies by more than 1 eV. For high oxygen vacancy concentrations, defect bands form inside the band gap that induce optical transitions and p-type conductivity. The resistivity changes by several orders of magnitude as a function of oxidation conditions. Oxygen vacancies do not give rise to ferromagnetic behavior.

Freie Schlagworte: defect states, dielectric thin films, electrical conductivity, electrical resistivity, energy gap, epitaxial layers, hafnium compounds, molecular beam epitaxial growth, oxidation, texture, vacancies (crystal)
Fachbereich(e)/-gebiet(e): 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Dünne Schichten
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft
11 Fachbereich Material- und Geowissenschaften
Hinterlegungsdatum: 07 Jan 2014 10:21
Letzte Änderung: 19 Sep 2014 07:52
PPN:
Sponsoren: This work was supported by DFG through Grant No. AL 560/13-1 and the LOEWE-Centre AdRIA
Export:
Suche nach Titel in: TUfind oder in Google
Frage zum Eintrag Frage zum Eintrag

Optionen (nur für Redakteure)
Redaktionelle Details anzeigen Redaktionelle Details anzeigen