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Hydrogen storage in Ti-TiO2 multilayers

Tarnawski, Z. and Kim-Ngan, Nhu-T. H. and Zakrzewska, K. and Drogowska, K. and Brudnik, A. and Balogh, A. G. and Kuzel, R. and Havela, L. and Sechovsky, V. :
Hydrogen storage in Ti-TiO2 multilayers.
[Online-Edition: http://iopscience.iop.org/2043-6262/4/2/025004]
In: Advances in Natural Sciences: Nanoscience and Nanotechnology, 4 (2) 025004.
[Article] , (2013)

Official URL: http://iopscience.iop.org/2043-6262/4/2/025004

Abstract

Multilayered thin films of Ti-TiO2 system have been investigated, focusing on all of the important parameters in both photocatalysis and H storage. Numerous Ti-TiO2 thin films with a single-, bi- and tri-layered structure have been deposited on different substrates by means of dc pulsed magnetron sputtering from a metallic Ti target in an inert Ar or reactive Ar + O2 atmosphere. The film chemical composition, depth profile, layer thickness and structure were determined by combined analysis of x-ray diffraction, x-ray reflectometry, Rutherford back- scattering and optical reflectivity spectra. The results show that the Ti films deposited on Si(111) exhibit a strong preferred orientation with the (00.1) plane parallel to the substrate, while a columnar structure was developed for TiO2 films. H charging at 1 bar and at 300 °C revealed that, in the case of the tri-layered structure of Ti/TiO2/Ti/Si(111), H diffused through the TiO2 layer without any accumulation in it. Pd acts as a catalyst for gathering H in Ti layers and up to 50% of H is stored in the topmost and bottom Ti layers. The preferential orientation in the Ti films was found to be destroyed upon hydrogenation at 100 bar. The hydride TiHx phase (x < 0.66) was formed under such a high H pressure.

Item Type: Article
Erschienen: 2013
Creators: Tarnawski, Z. and Kim-Ngan, Nhu-T. H. and Zakrzewska, K. and Drogowska, K. and Brudnik, A. and Balogh, A. G. and Kuzel, R. and Havela, L. and Sechovsky, V.
Title: Hydrogen storage in Ti-TiO2 multilayers
Language: English
Abstract:

Multilayered thin films of Ti-TiO2 system have been investigated, focusing on all of the important parameters in both photocatalysis and H storage. Numerous Ti-TiO2 thin films with a single-, bi- and tri-layered structure have been deposited on different substrates by means of dc pulsed magnetron sputtering from a metallic Ti target in an inert Ar or reactive Ar + O2 atmosphere. The film chemical composition, depth profile, layer thickness and structure were determined by combined analysis of x-ray diffraction, x-ray reflectometry, Rutherford back- scattering and optical reflectivity spectra. The results show that the Ti films deposited on Si(111) exhibit a strong preferred orientation with the (00.1) plane parallel to the substrate, while a columnar structure was developed for TiO2 films. H charging at 1 bar and at 300 °C revealed that, in the case of the tri-layered structure of Ti/TiO2/Ti/Si(111), H diffused through the TiO2 layer without any accumulation in it. Pd acts as a catalyst for gathering H in Ti layers and up to 50% of H is stored in the topmost and bottom Ti layers. The preferential orientation in the Ti films was found to be destroyed upon hydrogenation at 100 bar. The hydride TiHx phase (x < 0.66) was formed under such a high H pressure.

Journal or Publication Title: Advances in Natural Sciences: Nanoscience and Nanotechnology
Volume: 4
Number: 2
Divisions: 11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences > Material Science > Material Analytics
11 Department of Materials and Earth Sciences
Date Deposited: 23 Sep 2013 14:31
Official URL: http://iopscience.iop.org/2043-6262/4/2/025004
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