Tarnawski, Z. and Kim-Ngan, Nhu-T. H. and Zakrzewska, K. and Drogowska, K. and Brudnik, A. and Balogh, A. G. and Kuzel, R. and Havela, L. and Sechovsky, V. (2013):
Hydrogen storage in Ti-TiO2 multilayers.
4, In: Advances in Natural Sciences: Nanoscience and Nanotechnology, (2), pp. 025004, [Online-Edition: http://iopscience.iop.org/2043-6262/4/2/025004],
[Article]
Abstract
Multilayered thin films of Ti-TiO2 system have been investigated, focusing on all of the important parameters in both photocatalysis and H storage. Numerous Ti-TiO2 thin films with a single-, bi- and tri-layered structure have been deposited on different substrates by means of dc pulsed magnetron sputtering from a metallic Ti target in an inert Ar or reactive Ar + O2 atmosphere. The film chemical composition, depth profile, layer thickness and structure were determined by combined analysis of x-ray diffraction, x-ray reflectometry, Rutherford back- scattering and optical reflectivity spectra. The results show that the Ti films deposited on Si(111) exhibit a strong preferred orientation with the (00.1) plane parallel to the substrate, while a columnar structure was developed for TiO2 films. H charging at 1 bar and at 300 °C revealed that, in the case of the tri-layered structure of Ti/TiO2/Ti/Si(111), H diffused through the TiO2 layer without any accumulation in it. Pd acts as a catalyst for gathering H in Ti layers and up to 50% of H is stored in the topmost and bottom Ti layers. The preferential orientation in the Ti films was found to be destroyed upon hydrogenation at 100 bar. The hydride TiHx phase (x < 0.66) was formed under such a high H pressure.
| Item Type: | Article |
|---|---|
| Erschienen: | 2013 |
| Creators: | Tarnawski, Z. and Kim-Ngan, Nhu-T. H. and Zakrzewska, K. and Drogowska, K. and Brudnik, A. and Balogh, A. G. and Kuzel, R. and Havela, L. and Sechovsky, V. |
| Title: | Hydrogen storage in Ti-TiO2 multilayers |
| Language: | English |
| Abstract: | Multilayered thin films of Ti-TiO2 system have been investigated, focusing on all of the important parameters in both photocatalysis and H storage. Numerous Ti-TiO2 thin films with a single-, bi- and tri-layered structure have been deposited on different substrates by means of dc pulsed magnetron sputtering from a metallic Ti target in an inert Ar or reactive Ar + O2 atmosphere. The film chemical composition, depth profile, layer thickness and structure were determined by combined analysis of x-ray diffraction, x-ray reflectometry, Rutherford back- scattering and optical reflectivity spectra. The results show that the Ti films deposited on Si(111) exhibit a strong preferred orientation with the (00.1) plane parallel to the substrate, while a columnar structure was developed for TiO2 films. H charging at 1 bar and at 300 °C revealed that, in the case of the tri-layered structure of Ti/TiO2/Ti/Si(111), H diffused through the TiO2 layer without any accumulation in it. Pd acts as a catalyst for gathering H in Ti layers and up to 50% of H is stored in the topmost and bottom Ti layers. The preferential orientation in the Ti films was found to be destroyed upon hydrogenation at 100 bar. The hydride TiHx phase (x < 0.66) was formed under such a high H pressure. |
| Journal or Publication Title: | Advances in Natural Sciences: Nanoscience and Nanotechnology |
| Volume: | 4 |
| Number: | 2 |
| Divisions: | 11 Department of Materials and Earth Sciences > Material Science 11 Department of Materials and Earth Sciences > Material Science > Material Analytics 11 Department of Materials and Earth Sciences |
| Date Deposited: | 23 Sep 2013 14:31 |
| Official URL: | http://iopscience.iop.org/2043-6262/4/2/025004 |
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