Tarnawski, Z. ; Kim-Ngan, Nhu-T. H. ; Zakrzewska, K. ; Drogowska, K. ; Brudnik, A. ; Balogh, A. G. ; Kuzel, R. ; Havela, L. ; Sechovsky, V. (2013)
Hydrogen storage in Ti-TiO2 multilayers.
In: Advances in Natural Sciences: Nanoscience and Nanotechnology, 4 (2)
Artikel, Bibliographie
Kurzbeschreibung (Abstract)
Multilayered thin films of Ti-TiO2 system have been investigated, focusing on all of the important parameters in both photocatalysis and H storage. Numerous Ti-TiO2 thin films with a single-, bi- and tri-layered structure have been deposited on different substrates by means of dc pulsed magnetron sputtering from a metallic Ti target in an inert Ar or reactive Ar + O2 atmosphere. The film chemical composition, depth profile, layer thickness and structure were determined by combined analysis of x-ray diffraction, x-ray reflectometry, Rutherford back- scattering and optical reflectivity spectra. The results show that the Ti films deposited on Si(111) exhibit a strong preferred orientation with the (00.1) plane parallel to the substrate, while a columnar structure was developed for TiO2 films. H charging at 1 bar and at 300 °C revealed that, in the case of the tri-layered structure of Ti/TiO2/Ti/Si(111), H diffused through the TiO2 layer without any accumulation in it. Pd acts as a catalyst for gathering H in Ti layers and up to 50% of H is stored in the topmost and bottom Ti layers. The preferential orientation in the Ti films was found to be destroyed upon hydrogenation at 100 bar. The hydride TiHx phase (x < 0.66) was formed under such a high H pressure.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2013 |
| Autor(en): | Tarnawski, Z. ; Kim-Ngan, Nhu-T. H. ; Zakrzewska, K. ; Drogowska, K. ; Brudnik, A. ; Balogh, A. G. ; Kuzel, R. ; Havela, L. ; Sechovsky, V. |
| Art des Eintrags: | Bibliographie |
| Titel: | Hydrogen storage in Ti-TiO2 multilayers |
| Sprache: | Englisch |
| Publikationsjahr: | Juni 2013 |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Advances in Natural Sciences: Nanoscience and Nanotechnology |
| Jahrgang/Volume einer Zeitschrift: | 4 |
| (Heft-)Nummer: | 2 |
| URL / URN: | http://iopscience.iop.org/2043-6262/4/2/025004 |
| Kurzbeschreibung (Abstract): | Multilayered thin films of Ti-TiO2 system have been investigated, focusing on all of the important parameters in both photocatalysis and H storage. Numerous Ti-TiO2 thin films with a single-, bi- and tri-layered structure have been deposited on different substrates by means of dc pulsed magnetron sputtering from a metallic Ti target in an inert Ar or reactive Ar + O2 atmosphere. The film chemical composition, depth profile, layer thickness and structure were determined by combined analysis of x-ray diffraction, x-ray reflectometry, Rutherford back- scattering and optical reflectivity spectra. The results show that the Ti films deposited on Si(111) exhibit a strong preferred orientation with the (00.1) plane parallel to the substrate, while a columnar structure was developed for TiO2 films. H charging at 1 bar and at 300 °C revealed that, in the case of the tri-layered structure of Ti/TiO2/Ti/Si(111), H diffused through the TiO2 layer without any accumulation in it. Pd acts as a catalyst for gathering H in Ti layers and up to 50% of H is stored in the topmost and bottom Ti layers. The preferential orientation in the Ti films was found to be destroyed upon hydrogenation at 100 bar. The hydride TiHx phase (x < 0.66) was formed under such a high H pressure. |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialanalytik 11 Fachbereich Material- und Geowissenschaften |
| Hinterlegungsdatum: | 23 Sep 2013 14:31 |
| Letzte Änderung: | 23 Sep 2013 14:31 |
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