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RBS, XRR and optical reflectivity measurements of Ti-TiO2 thin films deposited by magnetron sputtering

Drogowska, K. and Tarnawski, Z. and Brudnik, A. and Kusior, E. and Sokolowski, M. and Zakrzewska, K. and Reszka, A. and Kim-Ngan, N.-T. H. and Balogh, A. G. :
RBS, XRR and optical reflectivity measurements of Ti-TiO2 thin films deposited by magnetron sputtering.
[Online-Edition: http://www.sciencedirect.com/science/article/pii/S0025540811...]
In: Materials Research Bulletin, 47 (2) pp. 296-301.
[Article] , (2012)

Official URL: http://www.sciencedirect.com/science/article/pii/S0025540811...

Abstract

Single-, bi- and tri-layered films of Ti–TiO2 system were deposited by d.c. pulsed magnetron sputtering from metallic Ti target in an inert Ar or reactive Ar + O2 atmosphere. The nominal thickness of each layer was 50 nm. The chemical composition and its depth profile were determined by Rutherford backscattering spectroscopy (RBS). Crystallographic structure was analysed by means of X-ray diffraction (XRD) at glancing incidence. X-ray reflectometry (XRR) was used as a complementary method for the film thickness and density evaluation. Modelling of the optical reflectivity spectra of Ti–TiO2 thin films deposited onto Si(1 1 1) substrates provided an independent estimate of the layer thickness. The combined analysis of RBS, XRR and reflectivity spectra indicated the real thickness of each layer less than 50 nm with TiO2 film density slightly lower than the corresponding bulk value. Scanning Electron Microscopy (SEM) cross-sectional images revealed the columnar growth of TiO2 layers. Thickness estimated directly from SEM studies was found to be in a good agreement with the results of RBS, XRR and reflectivity spectra.

Item Type: Article
Erschienen: 2012
Creators: Drogowska, K. and Tarnawski, Z. and Brudnik, A. and Kusior, E. and Sokolowski, M. and Zakrzewska, K. and Reszka, A. and Kim-Ngan, N.-T. H. and Balogh, A. G.
Title: RBS, XRR and optical reflectivity measurements of Ti-TiO2 thin films deposited by magnetron sputtering
Language: English
Abstract:

Single-, bi- and tri-layered films of Ti–TiO2 system were deposited by d.c. pulsed magnetron sputtering from metallic Ti target in an inert Ar or reactive Ar + O2 atmosphere. The nominal thickness of each layer was 50 nm. The chemical composition and its depth profile were determined by Rutherford backscattering spectroscopy (RBS). Crystallographic structure was analysed by means of X-ray diffraction (XRD) at glancing incidence. X-ray reflectometry (XRR) was used as a complementary method for the film thickness and density evaluation. Modelling of the optical reflectivity spectra of Ti–TiO2 thin films deposited onto Si(1 1 1) substrates provided an independent estimate of the layer thickness. The combined analysis of RBS, XRR and reflectivity spectra indicated the real thickness of each layer less than 50 nm with TiO2 film density slightly lower than the corresponding bulk value. Scanning Electron Microscopy (SEM) cross-sectional images revealed the columnar growth of TiO2 layers. Thickness estimated directly from SEM studies was found to be in a good agreement with the results of RBS, XRR and reflectivity spectra.

Journal or Publication Title: Materials Research Bulletin
Volume: 47
Number: 2
Publisher: Elsevier Science Publishing Company
Uncontrolled Keywords: A. Multilayers, B. Sputtering, C. X-ray diffraction, D. Crystal structure, Optical properties
Divisions: 11 Department of Materials and Earth Sciences
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences > Material Science > Material Analytics
Date Deposited: 19 Jan 2012 13:12
Official URL: http://www.sciencedirect.com/science/article/pii/S0025540811...
Funders: The authors highly acknowledge the financial support by Foundation for Polish Science MPD Programme co-financed by the EU European Regional Development Fund, project NN 515 080637 for science in 2009–2012,, the DAAD project D/08/07729, the MNiSW project Nr 651/N-DAAD/2010/0. It was partially supported by the Polish Ministry of Science and Higher Education and its grants for Scientific Research.
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