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Applications of Novel High-Aspect-Ratio Ultrathick UV Photoresist for Microelectroplating

Staab, Matthias and Greiner, P. F. and Schlosser, Michael and Schlaak, Helmut F. (2011):
Applications of Novel High-Aspect-Ratio Ultrathick UV Photoresist for Microelectroplating.
In: Microelectromechanical Systems, Journal of (JMEMS), IEEE, pp. 1-3, (99), ISSN 1057-7157, [Article]

Item Type: Article
Erschienen: 2011
Creators: Staab, Matthias and Greiner, P. F. and Schlosser, Michael and Schlaak, Helmut F.
Title: Applications of Novel High-Aspect-Ratio Ultrathick UV Photoresist for Microelectroplating
Language: English
Journal or Publication Title: Microelectromechanical Systems, Journal of (JMEMS)
Number: 99
Publisher: IEEE
Divisions: 18 Department of Electrical Engineering and Information Technology > Institute for Electromechanical Design > Microtechnology and Electromechanical Systems
18 Department of Electrical Engineering and Information Technology > Institute for Electromechanical Design
18 Department of Electrical Engineering and Information Technology
Date Deposited: 13 Jul 2011 14:34
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