Flege, S. ; Kraft, G. ; Bruder, E. ; Baba, K. ; Hatada, R. ; Ensinger, W. (2009)
Influence of sputter rate and crystal orientation on the distribution of carbon in polycrystalline copper surfaces treated by plasma immersion ion implantation.
In: Journal of Applied Physics 106, 106 (2)
Artikel, Bibliographie
Kurzbeschreibung (Abstract)
The sputter rate influences the resulting thickness of the carbon containing layer within a surface that was treated by plasma immersion ion implantation. Choosing a polycrystalline substrate with rather large crystals and a material with an inherent high sputter rate, inhomogeneous distributions of carbon over the substrate area due to different thicknesses of the incorporated carbon can be detected. A correlation of three factors namely the carbon x-ray intensity in electron probe microanalysis, the thickness of the carbon layer, and the sputter rate in depth profiling measurements via secondary ion mass spectrometry can be shown. Essential for these factors is the crystal orientation that is visualized by mapping via electron backscatter diffraction. The differences in carbon content due to the orientation are most likely one of the reasons that the adhesion of diamond-like carbon films on copper does not improve with an interlayer of implanted carbon.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2009 |
| Autor(en): | Flege, S. ; Kraft, G. ; Bruder, E. ; Baba, K. ; Hatada, R. ; Ensinger, W. |
| Art des Eintrags: | Bibliographie |
| Titel: | Influence of sputter rate and crystal orientation on the distribution of carbon in polycrystalline copper surfaces treated by plasma immersion ion implantation |
| Sprache: | Englisch |
| Publikationsjahr: | 20 Juli 2009 |
| Verlag: | American Institute of Physics |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Journal of Applied Physics 106 |
| Jahrgang/Volume einer Zeitschrift: | 106 |
| (Heft-)Nummer: | 2 |
| Kurzbeschreibung (Abstract): | The sputter rate influences the resulting thickness of the carbon containing layer within a surface that was treated by plasma immersion ion implantation. Choosing a polycrystalline substrate with rather large crystals and a material with an inherent high sputter rate, inhomogeneous distributions of carbon over the substrate area due to different thicknesses of the incorporated carbon can be detected. A correlation of three factors namely the carbon x-ray intensity in electron probe microanalysis, the thickness of the carbon layer, and the sputter rate in depth profiling measurements via secondary ion mass spectrometry can be shown. Essential for these factors is the crystal orientation that is visualized by mapping via electron backscatter diffraction. The differences in carbon content due to the orientation are most likely one of the reasons that the adhesion of diamond-like carbon films on copper does not improve with an interlayer of implanted carbon. |
| Freie Schlagworte: | adhesion, carbon, copper, crystal orientation, electron backscattering, electron diffraction, electron probe analysis, grain boundaries, plasma immersion ion implantation, polishing, secondary ion mass spectra, sputter deposition, thin films |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialanalytik 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Physikalische Metallkunde DFG-Sonderforschungsbereiche (inkl. Transregio) > Sonderforschungsbereiche > SFB 666: Integrale Blechbauweisen höherer Verzweigungsordnung 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften Zentrale Einrichtungen DFG-Sonderforschungsbereiche (inkl. Transregio) > Sonderforschungsbereiche DFG-Sonderforschungsbereiche (inkl. Transregio) |
| Hinterlegungsdatum: | 04 Apr 2011 13:40 |
| Letzte Änderung: | 05 Mär 2013 09:46 |
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