Baake, O. ; Hoffmann, P. S. ; Kosinova, M. L. ; Klein, Andreas ; Pollakowski, B. ; Beckhoff, B. ; Fainer, N. I. ; Trunova, V. A. ; Ensinger, W. (2010)
Analytical characterization of BCxNy films generated by LPCVD with triethylamine borane.
In: Analytical and Bioanalytical Chemistry, 398 (2)
doi: 10.1007/s00216-010-3965-4
Artikel, Bibliographie
Kurzbeschreibung (Abstract)
Triethylamine borane (TEAB) and He, N2 or NH3 were applied as additional reaction gases in the production of BCxNy layers by low-pressure chemical vapor deposition (LPCVD). These layers were deposited on Si(100) wafers and characterized chemically by X-ray photoelectron spectroscopy (XPS) and synchrotron radiation-based total-reflection X-ray fluorescence analysis combined with near-edge X-ray absorption fine-structure spectroscopy (TXRF-NEXAFS). The composition of the material produced without NH3 was found to be dominated by B–C bonds with the stoichiometric formula B2C3N. B–N bonds with the formula B2CN3 were preferred when NH3 was added. A first attempt was made to compare the results obtained by applying trimethylamine borane and TEAB as single-source precursors.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2010 |
| Autor(en): | Baake, O. ; Hoffmann, P. S. ; Kosinova, M. L. ; Klein, Andreas ; Pollakowski, B. ; Beckhoff, B. ; Fainer, N. I. ; Trunova, V. A. ; Ensinger, W. |
| Art des Eintrags: | Bibliographie |
| Titel: | Analytical characterization of BCxNy films generated by LPCVD with triethylamine borane |
| Sprache: | Englisch |
| Publikationsjahr: | September 2010 |
| Verlag: | Springer-Verlag |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Analytical and Bioanalytical Chemistry |
| Jahrgang/Volume einer Zeitschrift: | 398 |
| (Heft-)Nummer: | 2 |
| DOI: | 10.1007/s00216-010-3965-4 |
| Kurzbeschreibung (Abstract): | Triethylamine borane (TEAB) and He, N2 or NH3 were applied as additional reaction gases in the production of BCxNy layers by low-pressure chemical vapor deposition (LPCVD). These layers were deposited on Si(100) wafers and characterized chemically by X-ray photoelectron spectroscopy (XPS) and synchrotron radiation-based total-reflection X-ray fluorescence analysis combined with near-edge X-ray absorption fine-structure spectroscopy (TXRF-NEXAFS). The composition of the material produced without NH3 was found to be dominated by B–C bonds with the stoichiometric formula B2C3N. B–N bonds with the formula B2CN3 were preferred when NH3 was added. A first attempt was made to compare the results obtained by applying trimethylamine borane and TEAB as single-source precursors. |
| Freie Schlagworte: | LPCVD; Boron carbonitride films; XPS; TXRF-NEXAFS |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialanalytik 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Oberflächenforschung 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften |
| Hinterlegungsdatum: | 06 Dez 2010 12:46 |
| Letzte Änderung: | 25 Mär 2015 22:25 |
| PPN: | |
| Sponsoren: | The authors acknowledge the financial support granted by the Deutsche Forschungsgemeinschaft for the research projects “Nanolayer Speciation” (EN 207/22-1, BE 1372/2-1) and “Chemical and Physical Characterization of Nanolayers” (EN 207/22-2, BE 1372/2-2)., The authors from the Russian Federation thank RFBR for grant 07-03-91555-NNIO. |
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