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The effect of glas plasma on the deposition quality of Schottky metals and interconnect metallisation for planar diodes structure for THz applications

Ichizli, Victoria M. and Rodriguez-Girones, M. and Lin, Ch.-I. and Szeliga, P. and Hartnagel, H. L. (2001):
The effect of glas plasma on the deposition quality of Schottky metals and interconnect metallisation for planar diodes structure for THz applications.
In: International Conference on THz Electronics <9, 2001, Charlottesville, Virginia>: Proceedings, [Conference or Workshop Item]

Item Type: Conference or Workshop Item
Erschienen: 2001
Creators: Ichizli, Victoria M. and Rodriguez-Girones, M. and Lin, Ch.-I. and Szeliga, P. and Hartnagel, H. L.
Title: The effect of glas plasma on the deposition quality of Schottky metals and interconnect metallisation for planar diodes structure for THz applications
Language: English
Series Name: International Conference on THz Electronics <9, 2001, Charlottesville, Virginia>: Proceedings
Divisions: 18 Department of Electrical Engineering and Information Technology
18 Department of Electrical Engineering and Information Technology > Microwave Electronics
Date Deposited: 19 Nov 2008 16:28
License: [undefiniert]
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