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Hydrogen storage in Ti–TiO₂ multilayers

Tarnawski, Z. ; Kim-Ngan, Nhu-T. H. ; Zakrzewska, K. ; Drogowska, K. ; Brudnik, A. ; Balogh, A. G. ; Kužel, R. ; Havela, L. ; Sechovsky, V. (2013)
Hydrogen storage in Ti–TiO₂ multilayers.
In: Advances in Natural Sciences: Nanoscience and Nanotechnology, 4 (2)
doi: 10.1088/2043-6262/4/2/025004
Artikel, Bibliographie

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Kurzbeschreibung (Abstract)

Multilayered thin films of Ti–TiO₂ system have been investigated, focusing on all of the important parameters in both photocatalysis and H storage. Numerous Ti–TiO₂ thin films with a single-, bi- and tri-layered structure have been deposited on different substrates by means of dc pulsed magnetron sputtering from a metallic Ti target in an inert Ar or reactive Ar + O₂ atmosphere. The film chemical composition, depth profile, layer thickness and structure were determined by combined analysis of x-ray diffraction, x-ray reflectometry, Rutherford back- scattering and optical reflectivity spectra. The results show that the Ti films deposited on Si(111) exhibit a strong preferred orientation with the (00.1) plane parallel to the substrate, while a columnar structure was developed for TiO₂ films. H charging at 1 bar and at 300 °C revealed that, in the case of the tri-layered structure of Ti/TiO₂/Ti/Si(111), H diffused through the TiO₂ layer without any accumulation in it. Pd acts as a catalyst for gathering H in Ti layers and up to 50% of H is stored in the topmost and bottom Ti layers. The preferential orientation in the Ti films was found to be destroyed upon hydrogenation at 100 bar. The hydride TiHₓ phase (x < 0.66) was formed under such a high H pressure.

Typ des Eintrags: Artikel
Erschienen: 2013
Autor(en): Tarnawski, Z. ; Kim-Ngan, Nhu-T. H. ; Zakrzewska, K. ; Drogowska, K. ; Brudnik, A. ; Balogh, A. G. ; Kužel, R. ; Havela, L. ; Sechovsky, V.
Art des Eintrags: Bibliographie
Titel: Hydrogen storage in Ti–TiO₂ multilayers
Sprache: Englisch
Publikationsjahr: 2 April 2013
Ort: Bristol
Verlag: IOP Publishing
Titel der Zeitschrift, Zeitung oder Schriftenreihe: Advances in Natural Sciences: Nanoscience and Nanotechnology
Jahrgang/Volume einer Zeitschrift: 4
(Heft-)Nummer: 2
Kollation: 10 Seiten
DOI: 10.1088/2043-6262/4/2/025004
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Kurzbeschreibung (Abstract):

Multilayered thin films of Ti–TiO₂ system have been investigated, focusing on all of the important parameters in both photocatalysis and H storage. Numerous Ti–TiO₂ thin films with a single-, bi- and tri-layered structure have been deposited on different substrates by means of dc pulsed magnetron sputtering from a metallic Ti target in an inert Ar or reactive Ar + O₂ atmosphere. The film chemical composition, depth profile, layer thickness and structure were determined by combined analysis of x-ray diffraction, x-ray reflectometry, Rutherford back- scattering and optical reflectivity spectra. The results show that the Ti films deposited on Si(111) exhibit a strong preferred orientation with the (00.1) plane parallel to the substrate, while a columnar structure was developed for TiO₂ films. H charging at 1 bar and at 300 °C revealed that, in the case of the tri-layered structure of Ti/TiO₂/Ti/Si(111), H diffused through the TiO₂ layer without any accumulation in it. Pd acts as a catalyst for gathering H in Ti layers and up to 50% of H is stored in the topmost and bottom Ti layers. The preferential orientation in the Ti films was found to be destroyed upon hydrogenation at 100 bar. The hydride TiHₓ phase (x < 0.66) was formed under such a high H pressure.

ID-Nummer: Artikel-ID: 025004
Zusätzliche Informationen:

Invited talk at the 6th International Workshop on Advanced Materials Science and Nanotechnology IWAMSN2012, 30 October – 2 November, 2012, Ha Long, Vietnam.

Sachgruppe der Dewey Dezimalklassifikatin (DDC): 500 Naturwissenschaften und Mathematik > 530 Physik
500 Naturwissenschaften und Mathematik > 540 Chemie
Fachbereich(e)/-gebiet(e): 11 Fachbereich Material- und Geowissenschaften
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialanalytik
Hinterlegungsdatum: 11 Dez 2024 07:47
Letzte Änderung: 11 Dez 2024 07:47
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