Schmidt, Niclas ; Kaiser, Nico ; Vogel, Tobias ; Piros, Eszter ; Karthäuser, Silvia ; Waser, Rainer ; Alff, Lambert ; Dittmann, Regina (2024)
Impact of Non‐Stoichiometric Phases and Grain Boundaries on the Nanoscale Forming and Switching of HfOₓ Thin Films.
In: Advanced Electronic Materials, 2024, 10 (4)
doi: 10.26083/tuprints-00027119
Artikel, Zweitveröffentlichung, Verlagsversion
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Kurzbeschreibung (Abstract)
HfO₂ is one of the most common memristive materials and it is widely accepted that oxygen vacancies are prerequisite to reduce the forming voltage of the respective memristive devices. Here, a series of six oxygen engineered substoichiometric HfO₂₋ₓ thin films with varying oxygen deficiency is investigated by conductive atomic force microscopy (c‐AFM) and the switching process of substoichiometric films is observed on the nanoscale. X‐ray diffractometry (XRD) exhibits a phase transition from stoichiometric, monoclinic HfO₂ toward oxygen deficient, rhombohedral HfO₁.₇. The conductance of HfO₂₋ₓ is increasing with increasing oxygen deficiency, which is consistent with the increasing prevalence of the highly conductive rhombohedral phase. Simultaneously, c‐AFM reveals significant local conductivity differences between grains and grain boundaries, regardless of the level of oxygen deficiency. Single grains of highly oxygen deficient samples are formed at significant lower voltages. The mean forming voltage is reduced from (7.0 ± 0.6) V for HfO₂ to (1.9 ± 0.8) V for HfO₁.₇. Resistive switching on the nanoscale is established for single grains for the highest deficient thin film samples. The final resistance state is thereby dependent on the initial conductivity of the grains. These studies offer valuable insights into the switching behavior of memristive polycrystalline HfO₂.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2024 |
| Autor(en): | Schmidt, Niclas ; Kaiser, Nico ; Vogel, Tobias ; Piros, Eszter ; Karthäuser, Silvia ; Waser, Rainer ; Alff, Lambert ; Dittmann, Regina |
| Art des Eintrags: | Zweitveröffentlichung |
| Titel: | Impact of Non‐Stoichiometric Phases and Grain Boundaries on the Nanoscale Forming and Switching of HfOₓ Thin Films |
| Sprache: | Englisch |
| Publikationsjahr: | 12 Juni 2024 |
| Ort: | Darmstadt |
| Publikationsdatum der Erstveröffentlichung: | April 2024 |
| Ort der Erstveröffentlichung: | Weinheim |
| Verlag: | Wiley-VCH |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Advanced Electronic Materials |
| Jahrgang/Volume einer Zeitschrift: | 10 |
| (Heft-)Nummer: | 4 |
| Kollation: | 10 Seiten |
| DOI: | 10.26083/tuprints-00027119 |
| URL / URN: | https://tuprints.ulb.tu-darmstadt.de/27119 |
| Zugehörige Links: | |
| Herkunft: | Zweitveröffentlichung DeepGreen |
| Kurzbeschreibung (Abstract): | HfO₂ is one of the most common memristive materials and it is widely accepted that oxygen vacancies are prerequisite to reduce the forming voltage of the respective memristive devices. Here, a series of six oxygen engineered substoichiometric HfO₂₋ₓ thin films with varying oxygen deficiency is investigated by conductive atomic force microscopy (c‐AFM) and the switching process of substoichiometric films is observed on the nanoscale. X‐ray diffractometry (XRD) exhibits a phase transition from stoichiometric, monoclinic HfO₂ toward oxygen deficient, rhombohedral HfO₁.₇. The conductance of HfO₂₋ₓ is increasing with increasing oxygen deficiency, which is consistent with the increasing prevalence of the highly conductive rhombohedral phase. Simultaneously, c‐AFM reveals significant local conductivity differences between grains and grain boundaries, regardless of the level of oxygen deficiency. Single grains of highly oxygen deficient samples are formed at significant lower voltages. The mean forming voltage is reduced from (7.0 ± 0.6) V for HfO₂ to (1.9 ± 0.8) V for HfO₁.₇. Resistive switching on the nanoscale is established for single grains for the highest deficient thin film samples. The final resistance state is thereby dependent on the initial conductivity of the grains. These studies offer valuable insights into the switching behavior of memristive polycrystalline HfO₂. |
| Freie Schlagworte: | c‐AFM, defect engineering, grain boundaries, hafnium oxide, MBE, resistive switching |
| ID-Nummer: | Artikel-ID: 2300693 |
| Status: | Verlagsversion |
| URN: | urn:nbn:de:tuda-tuprints-271198 |
| Sachgruppe der Dewey Dezimalklassifikatin (DDC): | 600 Technik, Medizin, angewandte Wissenschaften > 660 Technische Chemie |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Dünne Schichten |
| Hinterlegungsdatum: | 12 Jun 2024 11:41 |
| Letzte Änderung: | 13 Jun 2024 06:39 |
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| Suche nach Titel in: | TUfind oder in Google |
Verfügbare Versionen dieses Eintrags
- Impact of Non‐Stoichiometric Phases and Grain Boundaries on the Nanoscale Forming and Switching of HfOₓ Thin Films. (deposited 12 Jun 2024 11:41) [Gegenwärtig angezeigt]
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