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Preparation of Aniline-Based Nitrogen-Containing Diamond-Like Carbon Films with Low Electrical Resistivity

Hatada, Ruriko ; Flege, Stefan ; Ensinger, Wolfgang ; Hesse, Sabine ; Tanabe, Shuji ; Nishimura, Yasuhisa ; Baba, Koumei (2023)
Preparation of Aniline-Based Nitrogen-Containing Diamond-Like Carbon Films with Low Electrical Resistivity.
In: Coatings, 2020, 10 (1)
doi: 10.26083/tuprints-00016108
Artikel, Zweitveröffentlichung, Verlagsversion

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Kurzbeschreibung (Abstract)

The intrinsic high electrical resistivity of diamond-like carbon (DLC) films prevents their use in certain applications. The addition of metal or nitrogen during the preparation of the DLC films leads to a lower resistivity of the films, but it is usually accompanied by several disadvantages, such as a potential contamination risk for surfaces in contact with the film, a limited area that can be coated, deteriorated mechanical properties or low deposition rates of the films. To avoid these problems, DLC films have been prepared by plasma source ion implantation using aniline as a precursor gas, either in pure form or mixed with acetylene. The nitrogen from the precursor aniline is incorporated into the DLC films, leading to a reduced electrical resistivity. Film properties such as hardness, surface roughness and friction coefficient are nearly unchanged as compared to an additionally prepared reference sample, which was deposited using only pure acetylene as precursor gas.

Typ des Eintrags: Artikel
Erschienen: 2023
Autor(en): Hatada, Ruriko ; Flege, Stefan ; Ensinger, Wolfgang ; Hesse, Sabine ; Tanabe, Shuji ; Nishimura, Yasuhisa ; Baba, Koumei
Art des Eintrags: Zweitveröffentlichung
Titel: Preparation of Aniline-Based Nitrogen-Containing Diamond-Like Carbon Films with Low Electrical Resistivity
Sprache: Englisch
Publikationsjahr: 28 November 2023
Ort: Darmstadt
Publikationsdatum der Erstveröffentlichung: 2020
Ort der Erstveröffentlichung: Basel
Verlag: MDPI
Titel der Zeitschrift, Zeitung oder Schriftenreihe: Coatings
Jahrgang/Volume einer Zeitschrift: 10
(Heft-)Nummer: 1
Kollation: 11 Seiten
DOI: 10.26083/tuprints-00016108
URL / URN: https://tuprints.ulb.tu-darmstadt.de/16108
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Herkunft: Zweitveröffentlichung DeepGreen
Kurzbeschreibung (Abstract):

The intrinsic high electrical resistivity of diamond-like carbon (DLC) films prevents their use in certain applications. The addition of metal or nitrogen during the preparation of the DLC films leads to a lower resistivity of the films, but it is usually accompanied by several disadvantages, such as a potential contamination risk for surfaces in contact with the film, a limited area that can be coated, deteriorated mechanical properties or low deposition rates of the films. To avoid these problems, DLC films have been prepared by plasma source ion implantation using aniline as a precursor gas, either in pure form or mixed with acetylene. The nitrogen from the precursor aniline is incorporated into the DLC films, leading to a reduced electrical resistivity. Film properties such as hardness, surface roughness and friction coefficient are nearly unchanged as compared to an additionally prepared reference sample, which was deposited using only pure acetylene as precursor gas.

Freie Schlagworte: diamond-like carbon, aniline, electrical resistivity, plasma-enhanced chemical vapor deposition, plasma source ion implantation
ID-Nummer: 54
Status: Verlagsversion
URN: urn:nbn:de:tuda-tuprints-161085
Zusätzliche Informationen:

This article belongs to the Special Issue Synthesis and Characterization of Diamond-Like Carbon Composite Films

Sachgruppe der Dewey Dezimalklassifikatin (DDC): 500 Naturwissenschaften und Mathematik > 540 Chemie
600 Technik, Medizin, angewandte Wissenschaften > 620 Ingenieurwissenschaften und Maschinenbau
Fachbereich(e)/-gebiet(e): 11 Fachbereich Material- und Geowissenschaften
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialanalytik
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Physics of Surfaces
Hinterlegungsdatum: 28 Nov 2023 13:50
Letzte Änderung: 29 Nov 2023 06:10
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