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Reactive Dual Magnetron Sputtering: A Fast Method for Preparing Stoichiometric Microcrystalline ZnWO₄ Thin Films

Hermans, Yannick ; Mehmood, Faraz ; Lakus-Wollny, Kerstin ; Hofmann, Jan P. ; Mayer, Thomas ; Jaegermann, Wolfram (2021)
Reactive Dual Magnetron Sputtering: A Fast Method for Preparing Stoichiometric Microcrystalline ZnWO₄ Thin Films.
In: Surfaces, 2021, 4 (2)
doi: 10.26083/tuprints-00019374
Artikel, Zweitveröffentlichung, Verlagsversion

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Kurzbeschreibung (Abstract)

Thin films of ZnWO₄, a promising photocatalytic and scintillator material, were deposited for the first time using a reactive dual magnetron sputtering procedure. A ZnO target was operated using an RF signal, and a W target was operated using a DC signal. The power on the ZnO target was changed so that it would match the sputtering rate of the W target operated at 25 W. The effects of the process parameters were characterized using optical spectroscopy, X-ray diffraction, and scanning electron microscopy, including energy dispersive X-ray spectroscopy as well as X-ray photoelectron spectroscopy. It was found that stoichiometric microcrystalline ZnWO₄ thin films could be obtained, by operating the ZnO target during the sputtering procedure at a power of 55 W and by post-annealing the resulting thin films for at least 10 h at 600 °C. As FTO coated glass substrates were used, annealing led as well to the incorporation of Na, resulting in n+ doped ZnWO₄ thin films.

Typ des Eintrags: Artikel
Erschienen: 2021
Autor(en): Hermans, Yannick ; Mehmood, Faraz ; Lakus-Wollny, Kerstin ; Hofmann, Jan P. ; Mayer, Thomas ; Jaegermann, Wolfram
Art des Eintrags: Zweitveröffentlichung
Titel: Reactive Dual Magnetron Sputtering: A Fast Method for Preparing Stoichiometric Microcrystalline ZnWO₄ Thin Films
Sprache: Englisch
Publikationsjahr: 2021
Publikationsdatum der Erstveröffentlichung: 2021
Verlag: MDPI
Titel der Zeitschrift, Zeitung oder Schriftenreihe: Surfaces
Jahrgang/Volume einer Zeitschrift: 4
(Heft-)Nummer: 2
DOI: 10.26083/tuprints-00019374
URL / URN: https://tuprints.ulb.tu-darmstadt.de/19374
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Herkunft: Zweitveröffentlichungsservice
Kurzbeschreibung (Abstract):

Thin films of ZnWO₄, a promising photocatalytic and scintillator material, were deposited for the first time using a reactive dual magnetron sputtering procedure. A ZnO target was operated using an RF signal, and a W target was operated using a DC signal. The power on the ZnO target was changed so that it would match the sputtering rate of the W target operated at 25 W. The effects of the process parameters were characterized using optical spectroscopy, X-ray diffraction, and scanning electron microscopy, including energy dispersive X-ray spectroscopy as well as X-ray photoelectron spectroscopy. It was found that stoichiometric microcrystalline ZnWO₄ thin films could be obtained, by operating the ZnO target during the sputtering procedure at a power of 55 W and by post-annealing the resulting thin films for at least 10 h at 600 °C. As FTO coated glass substrates were used, annealing led as well to the incorporation of Na, resulting in n+ doped ZnWO₄ thin films.

Status: Verlagsversion
URN: urn:nbn:de:tuda-tuprints-193749
Zusätzliche Informationen:

Supplementary Material: https://www.mdpi.com/2571-9637/4/2/13/s1

Sachgruppe der Dewey Dezimalklassifikatin (DDC): 500 Naturwissenschaften und Mathematik > 540 Chemie
600 Technik, Medizin, angewandte Wissenschaften > 620 Ingenieurwissenschaften und Maschinenbau
Fachbereich(e)/-gebiet(e): 11 Fachbereich Material- und Geowissenschaften
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Oberflächenforschung
Hinterlegungsdatum: 26 Aug 2021 12:30
Letzte Änderung: 31 Aug 2021 05:15
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