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Reactive Dual Magnetron Sputtering: A Fast Method for Preparing Stoichiometric Microcrystalline ZnWO4 Thin Films

Hermans, Yannick ; Mehmood, Faraz ; Lakus-Wollny, Kerstin ; Hofmann, Jan P. ; Mayer, Thomas ; Jaegermann, Wolfram (2021):
Reactive Dual Magnetron Sputtering: A Fast Method for Preparing Stoichiometric Microcrystalline ZnWO4 Thin Films.
4, In: Surfaces, (2), pp. 106-114. ISSN 2571-9637,
DOI: 10.3390/surfaces4020013,
[Article]

Item Type: Article
Erschienen: 2021
Creators: Hermans, Yannick ; Mehmood, Faraz ; Lakus-Wollny, Kerstin ; Hofmann, Jan P. ; Mayer, Thomas ; Jaegermann, Wolfram
Title: Reactive Dual Magnetron Sputtering: A Fast Method for Preparing Stoichiometric Microcrystalline ZnWO4 Thin Films
Language: English
Journal or Publication Title: Surfaces
Volume: 4
Number: 2
Divisions: 11 Department of Materials and Earth Sciences
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences > Material Science > Surface Science
Date Deposited: 11 May 2021 11:03
DOI: 10.3390/surfaces4020013
Official URL: https://doi.org/10.3390/surfaces4020013
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