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Graphene-enabled and directed nanomaterial placement from solution for large-scale device integration

Engel, Michael ; Farmer, Damon B. ; Azpiroz, Jaione Tirapu ; Seo, Jung-Woo T. ; Kang, Joohoon ; Avouris, Phaedon ; Hersam, Mark C. ; Krupke, Ralph ; Steiner, Mathias (2018)
Graphene-enabled and directed nanomaterial placement from solution for large-scale device integration.
In: Nature Communications, 9 (1)
doi: 10.1038/s41467-018-06604-4
Artikel, Bibliographie

Kurzbeschreibung (Abstract)

Directed placement of solution-based nanomaterials at predefined locations with nanoscale precision limits bottom-up integration in semiconductor process technology. We report a method for electric-field-assisted placement of nanomaterials from solution by means of large-scale graphene layers featuring nanoscale deposition sites. The structured graphene layers are prepared via either transfer or synthesis on standard substrates, and then are removed once nanomaterial deposition is completed, yielding material assemblies with nanoscale resolution that cover surface areas >1 mm2. In order to demonstrate the broad applicability, we have assembled representative zero-dimensional, one-dimensional, and two-dimensional semiconductors at predefined substrate locations and integrated them into nanoelectronic devices. Ultimately, this method opens a route to bottom-up integration of nanomaterials for industry-scale applications.

Typ des Eintrags: Artikel
Erschienen: 2018
Autor(en): Engel, Michael ; Farmer, Damon B. ; Azpiroz, Jaione Tirapu ; Seo, Jung-Woo T. ; Kang, Joohoon ; Avouris, Phaedon ; Hersam, Mark C. ; Krupke, Ralph ; Steiner, Mathias
Art des Eintrags: Bibliographie
Titel: Graphene-enabled and directed nanomaterial placement from solution for large-scale device integration
Sprache: Englisch
Publikationsjahr: 5 Oktober 2018
Verlag: Springer Nature
Titel der Zeitschrift, Zeitung oder Schriftenreihe: Nature Communications
Jahrgang/Volume einer Zeitschrift: 9
(Heft-)Nummer: 1
DOI: 10.1038/s41467-018-06604-4
URL / URN: https://www.nature.com/articles/s41467-018-06604-4
Kurzbeschreibung (Abstract):

Directed placement of solution-based nanomaterials at predefined locations with nanoscale precision limits bottom-up integration in semiconductor process technology. We report a method for electric-field-assisted placement of nanomaterials from solution by means of large-scale graphene layers featuring nanoscale deposition sites. The structured graphene layers are prepared via either transfer or synthesis on standard substrates, and then are removed once nanomaterial deposition is completed, yielding material assemblies with nanoscale resolution that cover surface areas >1 mm2. In order to demonstrate the broad applicability, we have assembled representative zero-dimensional, one-dimensional, and two-dimensional semiconductors at predefined substrate locations and integrated them into nanoelectronic devices. Ultimately, this method opens a route to bottom-up integration of nanomaterials for industry-scale applications.

Fachbereich(e)/-gebiet(e): 11 Fachbereich Material- und Geowissenschaften
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Molekulare Nanostrukturen
Hinterlegungsdatum: 20 Nov 2020 12:10
Letzte Änderung: 20 Nov 2020 12:10
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