Hegemann, Dirk ; Vohrer, U. ; Oehr, C. ; Riedel, Ralf (1999)
Deposition of SiOx films from O2/HMDSO plasmas.
th International Conference on Plasma Surface Engineering (PSE 98). Garmisch-Partenkirchen, GERMANY (14.09.1998-18.09.1998)
doi: 10.1016/S0257-8972(99)00092-4
Konferenzveröffentlichung, Bibliographie
Kurzbeschreibung (Abstract)
The variation of O2/HMDSO ratio in an r.f. plasma was carried out to optimize SiOx film properties and deposition rates for the coating of polymers. A ratio exceeding 6:1 yields scratch resistant, quartz-like films with low carbon contents. The chemical composition was analyzed to SiO1.8C0.3 by XPS. A compact plasma reactor was developed generating homogeneous plasmas and depositions over large areas (up to 380×290 mm2). Furthermore, the total coverage of three-dimensional formed parts was managed with good adhesion of SiOx films to polymers like PC and PBT to reduce wear.
| Typ des Eintrags: | Konferenzveröffentlichung |
|---|---|
| Erschienen: | 1999 |
| Autor(en): | Hegemann, Dirk ; Vohrer, U. ; Oehr, C. ; Riedel, Ralf |
| Art des Eintrags: | Bibliographie |
| Titel: | Deposition of SiOx films from O2/HMDSO plasmas |
| Sprache: | Englisch |
| Publikationsjahr: | September 1999 |
| Verlag: | Elsevier Science SA, Switzerland |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Surface and coatings technology |
| Reihe: | SURFACE & COATINGS TECHNOLOGY |
| Band einer Reihe: | 116 |
| Veranstaltungstitel: | th International Conference on Plasma Surface Engineering (PSE 98) |
| Veranstaltungsort: | Garmisch-Partenkirchen, GERMANY |
| Veranstaltungsdatum: | 14.09.1998-18.09.1998 |
| DOI: | 10.1016/S0257-8972(99)00092-4 |
| Kurzbeschreibung (Abstract): | The variation of O2/HMDSO ratio in an r.f. plasma was carried out to optimize SiOx film properties and deposition rates for the coating of polymers. A ratio exceeding 6:1 yields scratch resistant, quartz-like films with low carbon contents. The chemical composition was analyzed to SiO1.8C0.3 by XPS. A compact plasma reactor was developed generating homogeneous plasmas and depositions over large areas (up to 380×290 mm2). Furthermore, the total coverage of three-dimensional formed parts was managed with good adhesion of SiOx films to polymers like PC and PBT to reduce wear. |
| Freie Schlagworte: | Adhesion, R.f. plasma, SiOx films |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Disperse Feststoffe |
| Hinterlegungsdatum: | 19 Nov 2008 16:20 |
| Letzte Änderung: | 22 Aug 2018 08:16 |
| PPN: | |
| Sponsoren: | Parts of this work were supported by the German Wirtschaftsministerium Baden Württemberg (reference no. 4-4332.62-IGB/1) as well as several industrial partners. |
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