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Cobalt oxide thin film low pressure metal-organic chemical vapor deposition

Schmid, Stefan ; Hausbrand, René ; Jaegermann, Wolfram (2014)
Cobalt oxide thin film low pressure metal-organic chemical vapor deposition.
In: Thin Solid Films, 567
doi: 10.1016/j.tsf.2014.07.029
Article, Bibliographie

Item Type: Article
Erschienen: 2014
Creators: Schmid, Stefan ; Hausbrand, René ; Jaegermann, Wolfram
Type of entry: Bibliographie
Title: Cobalt oxide thin film low pressure metal-organic chemical vapor deposition
Language: English
Date: September 2014
Journal or Publication Title: Thin Solid Films
Volume of the journal: 567
DOI: 10.1016/j.tsf.2014.07.029
Divisions: 11 Department of Materials and Earth Sciences
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences > Material Science > Surface Science
Exzellenzinitiative
Exzellenzinitiative > Clusters of Excellence
Zentrale Einrichtungen
Exzellenzinitiative > Clusters of Excellence > Center of Smart Interfaces (CSI)
Date Deposited: 17 Dec 2014 14:01
Last Modified: 13 Nov 2018 14:34
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