Hawraneck, Matthias ; Zimmer, Jürgen ; Raberg, Wolfgang ; Prügl, Klemens ; Schmitt, Stephan ; Bever, Thomas ; Flege, Stefan ; Alff, Lambert (2008):
Diffusion based degradation mechanisms in giant magnetoresistive spin valves.
In: Applied Physics Letters, 93 (1), pp. 012504. American Institute of Physics, ISSN 00036951,
[Article]
Abstract
Spin valve systems based on the giant magnetoresistive effect as used, for example, in hard disks and automotive applications consist of several functional metallic thin film layers. We have identified by secondary ion mass spectrometry two main degradation mechanisms: one is related to oxygen diffusion through a protective cap layer and the other one is interdiffusion directly at the functional layers of the giant magnetoresistive stack. By choosing a suitable material as cap layer (TaN), the oxidation effect can be suppressed.
Item Type: | Article |
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Erschienen: | 2008 |
Creators: | Hawraneck, Matthias ; Zimmer, Jürgen ; Raberg, Wolfgang ; Prügl, Klemens ; Schmitt, Stephan ; Bever, Thomas ; Flege, Stefan ; Alff, Lambert |
Title: | Diffusion based degradation mechanisms in giant magnetoresistive spin valves |
Language: | English |
Abstract: | Spin valve systems based on the giant magnetoresistive effect as used, for example, in hard disks and automotive applications consist of several functional metallic thin film layers. We have identified by secondary ion mass spectrometry two main degradation mechanisms: one is related to oxygen diffusion through a protective cap layer and the other one is interdiffusion directly at the functional layers of the giant magnetoresistive stack. By choosing a suitable material as cap layer (TaN), the oxidation effect can be suppressed. |
Journal or Publication Title: | Applied Physics Letters |
Journal Volume: | 93 |
Issue Number: | 1 |
Publisher: | American Institute of Physics |
Uncontrolled Keywords: | chemical interdiffusion, magnetic thin films, magnetoresistance, metallic thin films, oxidation, secondary ion mass spectra, spin valves, tantalum, tantalum compounds |
Divisions: | 11 Department of Materials and Earth Sciences > Material Science > Advanced Thin Film Technology 11 Department of Materials and Earth Sciences > Material Science > Material Analytics 11 Department of Materials and Earth Sciences > Material Science 11 Department of Materials and Earth Sciences |
Date Deposited: | 29 Mar 2012 10:56 |
URL / URN: | http://dx.doi.org/10.1063/1.2956394 |
Identification Number: | doi:10.1063/1.2956394 |
Funders: | This work was supported by the BMBF Project No. 13N9084. |
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