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Methane plasma-based ion implantation of metallic and galvanically oxidized tantalum

Flege, Stefan ; Baba, Koumei ; Hatada, Ruriko ; Ensinger, Wolfgang (2011)
Methane plasma-based ion implantation of metallic and galvanically oxidized tantalum.
In: Surface and Coatings Technology, 206 (5)
Article, Bibliographie

Abstract

Tantalum and oxidized tantalum exhibit distinct differences when treated with plasma-based ion implantation of methane with − 20 kV. The implantation profiles of carbon are similar, but carbides are formed in the case of tantalum, as verified with X-ray diffraction and X-ray photoelectron spectrometry in combination with depth profiling, whereas there is no detectable carbide in the tantalum oxide film. The distributions of the co-implanted hydrogen also vary in that the intensity in depth profiling with secondary ion mass spectrometry does steadily decrease in the oxidized Ta, while in the metallic Ta it shows a short indentation below the surface and then decreases only very slowly.

Item Type: Article
Erschienen: 2011
Creators: Flege, Stefan ; Baba, Koumei ; Hatada, Ruriko ; Ensinger, Wolfgang
Type of entry: Bibliographie
Title: Methane plasma-based ion implantation of metallic and galvanically oxidized tantalum
Language: English
Date: 25 November 2011
Publisher: Elsevier Science Publishing Company
Journal or Publication Title: Surface and Coatings Technology
Volume of the journal: 206
Issue Number: 5
URL / URN: http://www.sciencedirect.com/science/article/pii/S0257897211...
Abstract:

Tantalum and oxidized tantalum exhibit distinct differences when treated with plasma-based ion implantation of methane with − 20 kV. The implantation profiles of carbon are similar, but carbides are formed in the case of tantalum, as verified with X-ray diffraction and X-ray photoelectron spectrometry in combination with depth profiling, whereas there is no detectable carbide in the tantalum oxide film. The distributions of the co-implanted hydrogen also vary in that the intensity in depth profiling with secondary ion mass spectrometry does steadily decrease in the oxidized Ta, while in the metallic Ta it shows a short indentation below the surface and then decreases only very slowly.

Uncontrolled Keywords: Carbide, Methane plasma, Plasma based ion implantation, Secondary ion mass spectrometry, Tantalum
Additional Information:

Surface Modification of Materials by Ion beams 2009 — SMMIB 2009

Proceedings of the 16th International Conference on Surface Modification of Materials by Ion Beams

Divisions: 11 Department of Materials and Earth Sciences > Material Science > Material Analytics
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences
Date Deposited: 18 Nov 2011 13:43
Last Modified: 05 Mar 2013 09:55
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