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Amorphisation of (100) oriented silicon by self implantation

Klein, Sylke ; Hahn, ; Balogh, ; Rück, ; Baumann, ; Michelmann, (1995)
Amorphisation of (100) oriented silicon by self implantation.
In: Institut für Kernphysik der J. W. Goethe Universität, Frankfurt/Main: Jahresbericht 1995, S. 45
Article, Bibliographie

Item Type: Article
Erschienen: 1995
Creators: Klein, Sylke ; Hahn, ; Balogh, ; Rück, ; Baumann, ; Michelmann,
Type of entry: Bibliographie
Title: Amorphisation of (100) oriented silicon by self implantation
Language: English
Date: 1 January 1995
Journal or Publication Title: Institut für Kernphysik der J. W. Goethe Universität, Frankfurt/Main: Jahresbericht 1995, S. 45
Divisions: 11 Department of Materials and Earth Sciences
11 Department of Materials and Earth Sciences > Department of Earth Sciences (1999 merged into Department of Materials and Earth Sciences)
Date Deposited: 19 Nov 2008 16:00
Last Modified: 20 Feb 2020 13:32
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