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XPS analysis of wet chemical etching of GaAs(110) by Br2/H20: Comparison of emersion and model experiments

Beerbom, M. ; Henrion, O. ; Klein, Andreas ; Mayer, T. ; Jaegermann, W. (2000):
XPS analysis of wet chemical etching of GaAs(110) by Br2/H20: Comparison of emersion and model experiments.
In: Electrochimica Acta, 45, pp. 4663-4672. ISSN 00134686,
[Article]

Item Type: Article
Erschienen: 2000
Creators: Beerbom, M. ; Henrion, O. ; Klein, Andreas ; Mayer, T. ; Jaegermann, W.
Title: XPS analysis of wet chemical etching of GaAs(110) by Br2/H20: Comparison of emersion and model experiments
Language: English
Journal or Publication Title: Electrochimica Acta
Volume of the journal: 45
Divisions: 11 Department of Materials and Earth Sciences
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences > Material Science > Surface Science
Date Deposited: 19 Nov 2008 16:00
Identification Number: doi:10.1016/S0013-4686(00)00618-6
License: [undefiniert]
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