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Distribution of carbon in polycrystalline copper surfaces treated by methane plasma immersion ion implantation

Flege, Stefan ; Kraft, Gunther ; Baba, Koumei ; Hatada, Ruriko ; Ensinger, Wolfgang (2009)
Distribution of carbon in polycrystalline copper surfaces treated by methane plasma immersion ion implantation.
In: Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms, 267 (8-9)
doi: 10.1016/j.nimb.2009.01.126
Article, Bibliographie

Abstract

Copper substrates with rather large grains (dimensions of some mm) treated by pulsed methane plasma immersion ion implantation exhibit a laterally inhomogeneous carbon distribution. Areas with high carbon X-ray intensity in electron probe microanalysis coincide with thicker carbon containing layers as seen in sputter depth profiling via secondary ion mass spectrometry. The distribution of carbon within the surface depends not only on the treatment time and pulse repetition rate but also on the orientation of the individual copper grains.

Item Type: Article
Erschienen: 2009
Creators: Flege, Stefan ; Kraft, Gunther ; Baba, Koumei ; Hatada, Ruriko ; Ensinger, Wolfgang
Type of entry: Bibliographie
Title: Distribution of carbon in polycrystalline copper surfaces treated by methane plasma immersion ion implantation
Language: English
Date: 1 May 2009
Publisher: Elsevier Science Publishing Company
Journal or Publication Title: Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms
Volume of the journal: 267
Issue Number: 8-9
DOI: 10.1016/j.nimb.2009.01.126
Abstract:

Copper substrates with rather large grains (dimensions of some mm) treated by pulsed methane plasma immersion ion implantation exhibit a laterally inhomogeneous carbon distribution. Areas with high carbon X-ray intensity in electron probe microanalysis coincide with thicker carbon containing layers as seen in sputter depth profiling via secondary ion mass spectrometry. The distribution of carbon within the surface depends not only on the treatment time and pulse repetition rate but also on the orientation of the individual copper grains.

Uncontrolled Keywords: Plasma immersion ion implantation; SIMS; EPMA
Additional Information:

Proceedings of the 16th International Conference on Ion Beam Modification of Materials

Divisions: 11 Department of Materials and Earth Sciences > Material Science > Material Analytics
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences
Date Deposited: 29 Jun 2009 14:35
Last Modified: 05 Mar 2013 09:20
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