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{B[C2H4Si(CH3)NH]2[C2H4Si(CH3)N(SiH2Ph)]}n: The first polyborosilazane precursor for silicoboron carbonitride stable to 2200°C

Wang, Z.-C. ; Gerstel, P. ; Kaiser, G. ; Hummer, H. ; Kummer, H. ; Bill, J. ; Aldinger, F. ; Riedel, R. (2001)
{B[C2H4Si(CH3)NH]2[C2H4Si(CH3)N(SiH2Ph)]}n: The first polyborosilazane precursor for silicoboron carbonitride stable to 2200°C.
In: Chemistry letters
Article, Bibliographie

Item Type: Article
Erschienen: 2001
Creators: Wang, Z.-C. ; Gerstel, P. ; Kaiser, G. ; Hummer, H. ; Kummer, H. ; Bill, J. ; Aldinger, F. ; Riedel, R.
Type of entry: Bibliographie
Title: {B[C2H4Si(CH3)NH]2[C2H4Si(CH3)N(SiH2Ph)]}n: The first polyborosilazane precursor for silicoboron carbonitride stable to 2200°C
Language: English
Date: 2001
Journal or Publication Title: Chemistry letters
Additional Information:

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Divisions: 11 Department of Materials and Earth Sciences
Date Deposited: 19 Nov 2008 16:27
Last Modified: 20 Feb 2020 13:27
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