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Diamond-Like Carbon Films with Low Internal Stress by a Simple Bilayer Approach

Baba, Koumei ; Hatada, Ruriko ; Flege, Stefan ; Ensinger, Wolfgang (2020)
Diamond-Like Carbon Films with Low Internal Stress by a Simple Bilayer Approach.
In: Coatings, 10 (7)
doi: 10.3390/coatings10070696
Article, Bibliographie

Abstract

Amorphous carbon films with a high hardness usually suffer from high internal stress. To deposit films with a hard top surface but reduced internal stress, a simple bilayer approach was used. Films were prepared by plasma source ion implantation, using only hydrocarbon precursors. The single layer with the highest hardness (deposited by a low direct current (DC) voltage and radio frequency (RF) generation of the plasma) has the highest internal stress with more than 3.5 GPa. By adding an interlayer with a lower hardness, the resulting stress of the bilayer film can be reduced to below 1.4 GPa while maintaining the high hardness of the top layer. By avoiding metallic interlayers or dopants within the films, the deposition process can be kept simple and cost-effective, and it is also suitable for three-dimensional samples.

Item Type: Article
Erschienen: 2020
Creators: Baba, Koumei ; Hatada, Ruriko ; Flege, Stefan ; Ensinger, Wolfgang
Type of entry: Bibliographie
Title: Diamond-Like Carbon Films with Low Internal Stress by a Simple Bilayer Approach
Language: English
Date: 19 July 2020
Publisher: MDPI
Journal or Publication Title: Coatings
Volume of the journal: 10
Issue Number: 7
DOI: 10.3390/coatings10070696
URL / URN: https://www.mdpi.com/2079-6412/10/7/696
Abstract:

Amorphous carbon films with a high hardness usually suffer from high internal stress. To deposit films with a hard top surface but reduced internal stress, a simple bilayer approach was used. Films were prepared by plasma source ion implantation, using only hydrocarbon precursors. The single layer with the highest hardness (deposited by a low direct current (DC) voltage and radio frequency (RF) generation of the plasma) has the highest internal stress with more than 3.5 GPa. By adding an interlayer with a lower hardness, the resulting stress of the bilayer film can be reduced to below 1.4 GPa while maintaining the high hardness of the top layer. By avoiding metallic interlayers or dopants within the films, the deposition process can be kept simple and cost-effective, and it is also suitable for three-dimensional samples.

Uncontrolled Keywords: Diamond-like carbon, hardness, bilayer, plasma source ion implantation, internal stress
Divisions: 11 Department of Materials and Earth Sciences
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences > Material Science > Material Analytics
Date Deposited: 20 Nov 2020 08:15
Last Modified: 20 Nov 2020 08:15
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