Rajasekaran, Pradeep Ramiah ; Zhou, Chuanhong ; Dasari, Mallika ; Voss, Kay-Obbe ; Trautmann, Christina ; Kohli, Punit (2017)
Polymeric lithography editor: Editing lithographic errors with nanoporous polymeric probes.
In: Science Advances, 3 (6)
doi: 10.1126/sciadv.1602071
Artikel, Bibliographie
Kurzbeschreibung (Abstract)
A new lithographic editing system with an ability to erase and rectify errors in microscale with real-time optical feedback is demonstrated. The erasing probe is a conically shaped hydrogel (tip size, ca. 500 nm) template-synthesized from track-etched conical glass wafers. The “nanosponge” hydrogel probe “erases” patterns by hydrating and absorbing molecules into a porous hydrogel matrix via diffusion analogous to a wet sponge. The presence of an interfacial liquid water layer between the hydrogel tip and the substrate during erasing enables frictionless, uninterrupted translation of the eraser on the substrate. The erasing capacity of the hydrogel is extremely high because of the large free volume of the hydrogel matrix. The fast frictionless translocation and interfacial hydration resulted in an extremely high erasing rate (~785 μm2/s), which is two to three orders of magnitude higher in comparison with the atomic force microscopy–based erasing (~0.1 μm2/s) experiments. The high precision and accuracy of the polymeric lithography editor (PLE) system stemmed from coupling piezoelectric actuators to an inverted optical microscope. Subsequently after erasing the patterns using agarose erasers, a polydimethylsiloxane probe fabricated from the same conical track-etched template was used to precisely redeposit molecules of interest at the erased spots. PLE also provides a continuous optical feedback throughout the entire molecular editing process—writing, erasing, and rewriting. To demonstrate its potential in device fabrication, we used PLE to electrochemically erase metallic copper thin film, forming an interdigitated array of microelectrodes for the fabrication of a functional microphotodetector device. High-throughput dot and line erasing, writing with the conical “wet nanosponge,” and continuous optical feedback make PLE complementary to the existing catalog of nanolithographic/microlithographic and three-dimensional printing techniques. This new PLE technique will potentially open up many new and exciting avenues in lithography, which remain unexplored due to the inherent limitations in error rectification capabilities of the existing lithographic techniques.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2017 |
| Autor(en): | Rajasekaran, Pradeep Ramiah ; Zhou, Chuanhong ; Dasari, Mallika ; Voss, Kay-Obbe ; Trautmann, Christina ; Kohli, Punit |
| Art des Eintrags: | Bibliographie |
| Titel: | Polymeric lithography editor: Editing lithographic errors with nanoporous polymeric probes |
| Sprache: | Englisch |
| Publikationsjahr: | 9 Juni 2017 |
| Verlag: | American Association for the Advancement of Science |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Science Advances |
| Jahrgang/Volume einer Zeitschrift: | 3 |
| (Heft-)Nummer: | 6 |
| DOI: | 10.1126/sciadv.1602071 |
| URL / URN: | https://doi.org/10.1126/sciadv.1602071 |
| Kurzbeschreibung (Abstract): | A new lithographic editing system with an ability to erase and rectify errors in microscale with real-time optical feedback is demonstrated. The erasing probe is a conically shaped hydrogel (tip size, ca. 500 nm) template-synthesized from track-etched conical glass wafers. The “nanosponge” hydrogel probe “erases” patterns by hydrating and absorbing molecules into a porous hydrogel matrix via diffusion analogous to a wet sponge. The presence of an interfacial liquid water layer between the hydrogel tip and the substrate during erasing enables frictionless, uninterrupted translation of the eraser on the substrate. The erasing capacity of the hydrogel is extremely high because of the large free volume of the hydrogel matrix. The fast frictionless translocation and interfacial hydration resulted in an extremely high erasing rate (~785 μm2/s), which is two to three orders of magnitude higher in comparison with the atomic force microscopy–based erasing (~0.1 μm2/s) experiments. The high precision and accuracy of the polymeric lithography editor (PLE) system stemmed from coupling piezoelectric actuators to an inverted optical microscope. Subsequently after erasing the patterns using agarose erasers, a polydimethylsiloxane probe fabricated from the same conical track-etched template was used to precisely redeposit molecules of interest at the erased spots. PLE also provides a continuous optical feedback throughout the entire molecular editing process—writing, erasing, and rewriting. To demonstrate its potential in device fabrication, we used PLE to electrochemically erase metallic copper thin film, forming an interdigitated array of microelectrodes for the fabrication of a functional microphotodetector device. High-throughput dot and line erasing, writing with the conical “wet nanosponge,” and continuous optical feedback make PLE complementary to the existing catalog of nanolithographic/microlithographic and three-dimensional printing techniques. This new PLE technique will potentially open up many new and exciting avenues in lithography, which remain unexplored due to the inherent limitations in error rectification capabilities of the existing lithographic techniques. |
| Freie Schlagworte: | Molecular esiting using litography, erasing, patterning, polymer eraser, device fabrication |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Ionenstrahlmodifizierte Materialien 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften |
| Hinterlegungsdatum: | 29 Dez 2017 10:03 |
| Letzte Änderung: | 29 Dez 2017 10:03 |
| PPN: | |
| Sponsoren: | We acknowledge partial financial support of this work from the NSF (CHE-0748676 and CHE-0959568), the NIH (GM 106364 and GM 080711), and the Office of Vice Chancellor of Research at the SIUC., The SEM used in this work was purchased through a grant from the NSF (CHE 0959568). |
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