Uzum, C. ; Hellwig, J. ; Madaboosi, N. ; Volodkin, D. ; Klitzing, R. von (2012)
Growth behaviour and mechanical properties of PLL/HA multilayer films studied by AFM.
In: Beilstein Journal of Nanotechnology, 2012 (3)
doi: 10.3762/bjnano.3.87
Artikel, Bibliographie
Dies ist die neueste Version dieses Eintrags.
Kurzbeschreibung (Abstract)
Scanning- and colloidal-probe atomic force microscopy were used to study the mechanical properties of poly(L-lysine)/hyaluronan (PLL/HA)n films as a function of indentation velocity and the number of polymer deposition steps n. The film thickness was determined by two independent AFM-based methods: scratch-and-scan and newly developed full-indentation. The advantages and disadvantages of both methods are highlighted, and error minimization techniques in elasticity measurements are addressed. It was found that the film thickness increases linearly with the bilayer number n, ranging between 400 and 7500 nm for n = 12 and 96, respectively. The apparent Young’s modulus E ranges between 15 and 40 kPa and does not depend on the indenter size or the film bilayer number n. Stress relaxation measurements show that PLL/HA films have a viscoelastic behaviour, regardless of their thickness. If indentation is performed several times at the same lateral position on the film, a viscous/plastic deformation takes place.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2012 |
| Autor(en): | Uzum, C. ; Hellwig, J. ; Madaboosi, N. ; Volodkin, D. ; Klitzing, R. von |
| Art des Eintrags: | Bibliographie |
| Titel: | Growth behaviour and mechanical properties of PLL/HA multilayer films studied by AFM |
| Sprache: | Englisch |
| Publikationsjahr: | 2012 |
| Verlag: | Beilstein-Institut |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Beilstein Journal of Nanotechnology |
| Jahrgang/Volume einer Zeitschrift: | 2012 |
| (Heft-)Nummer: | 3 |
| DOI: | 10.3762/bjnano.3.87 |
| Zugehörige Links: | |
| Kurzbeschreibung (Abstract): | Scanning- and colloidal-probe atomic force microscopy were used to study the mechanical properties of poly(L-lysine)/hyaluronan (PLL/HA)n films as a function of indentation velocity and the number of polymer deposition steps n. The film thickness was determined by two independent AFM-based methods: scratch-and-scan and newly developed full-indentation. The advantages and disadvantages of both methods are highlighted, and error minimization techniques in elasticity measurements are addressed. It was found that the film thickness increases linearly with the bilayer number n, ranging between 400 and 7500 nm for n = 12 and 96, respectively. The apparent Young’s modulus E ranges between 15 and 40 kPa and does not depend on the indenter size or the film bilayer number n. Stress relaxation measurements show that PLL/HA films have a viscoelastic behaviour, regardless of their thickness. If indentation is performed several times at the same lateral position on the film, a viscous/plastic deformation takes place. |
| Fachbereich(e)/-gebiet(e): | 05 Fachbereich Physik 05 Fachbereich Physik > Institut für Festkörperphysik (2021 umbenannt in Institut für Physik Kondensierter Materie (IPKM)) |
| Hinterlegungsdatum: | 28 Apr 2017 10:55 |
| Letzte Änderung: | 26 Jul 2024 08:27 |
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Growth behaviour and mechanical properties of PLL/HA multilayer films studied by AFM. (deposited 03 Sep 2021 12:43)
- Growth behaviour and mechanical properties of PLL/HA multilayer films studied by AFM. (deposited 28 Apr 2017 10:55) [Gegenwärtig angezeigt]
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