Morasch, Jan ; Li, Shunyi ; Broetz, Joachim ; Jaegermann, Wolfram ; Klein, Andreas (2014)
Reactively magnetron sputtered Bi2O3 thin films: Analysis of structure, optoelectronic, interface, and photovoltaic properties.
In: physica status solidi (a), 211 (1)
doi: 10.1002/pssa.201330216
Artikel, Bibliographie
Kurzbeschreibung (Abstract)
Bi2O3 thin films deposited by RF magnetron sputtering have been studied in situ by using photoelectron spectroscopy. UV/VIS transmission spectroscopy and XRD measurements were carried out to determine the optical and structural properties of the films. Thin film solar cells were built up with ITO|Bi2O3|Au layer structures. These devices were characterized by current–voltage and capacitance–frequency measurements. Open-circuit voltages up to 680 mV and short-circuit current densities of about 0.3 mA cm−2 were observed. In addition, relative permittivities of approximately 45 have been measured. In order to determine the energy band alignment of Bi2O3 with different contact materials, interface experiments were carried out. With stepwise depositions of the contact material combined with in situ observation of the Fermi level shift via X-ray photoelectron spectroscopy, it is possible to measure the energy barrier height between a semiconductor and a metallic contact. The work functions of the different materials were determined by UV photoelectron spectroscopy.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2014 |
| Autor(en): | Morasch, Jan ; Li, Shunyi ; Broetz, Joachim ; Jaegermann, Wolfram ; Klein, Andreas |
| Art des Eintrags: | Bibliographie |
| Titel: | Reactively magnetron sputtered Bi2O3 thin films: Analysis of structure, optoelectronic, interface, and photovoltaic properties |
| Sprache: | Englisch |
| Publikationsjahr: | Januar 2014 |
| Verlag: | WILEY-VCH Verlag GmbH & Co. KGaA |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | physica status solidi (a) |
| Jahrgang/Volume einer Zeitschrift: | 211 |
| (Heft-)Nummer: | 1 |
| DOI: | 10.1002/pssa.201330216 |
| Kurzbeschreibung (Abstract): | Bi2O3 thin films deposited by RF magnetron sputtering have been studied in situ by using photoelectron spectroscopy. UV/VIS transmission spectroscopy and XRD measurements were carried out to determine the optical and structural properties of the films. Thin film solar cells were built up with ITO|Bi2O3|Au layer structures. These devices were characterized by current–voltage and capacitance–frequency measurements. Open-circuit voltages up to 680 mV and short-circuit current densities of about 0.3 mA cm−2 were observed. In addition, relative permittivities of approximately 45 have been measured. In order to determine the energy band alignment of Bi2O3 with different contact materials, interface experiments were carried out. With stepwise depositions of the contact material combined with in situ observation of the Fermi level shift via X-ray photoelectron spectroscopy, it is possible to measure the energy barrier height between a semiconductor and a metallic contact. The work functions of the different materials were determined by UV photoelectron spectroscopy. |
| Freie Schlagworte: | Bi2O3, magnetron sputtering, photovoltaic properties, thin film |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Oberflächenforschung 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Strukturforschung 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften |
| Hinterlegungsdatum: | 27 Feb 2015 13:24 |
| Letzte Änderung: | 29 Mär 2015 17:28 |
| PPN: | |
| Sponsoren: | Funded by the German Science Foundation (DFG) |
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