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Potential distribution in channel of thin-film transistors

Okamura, Koshi ; Hahn, Horst (2012)
Potential distribution in channel of thin-film transistors.
In: Applied Physics Letters, 101 (1)
doi: 10.1063/1.4733290
Artikel, Bibliographie

Kurzbeschreibung (Abstract)

Channel voltages of ZnO thin-film transistors during operation are precisely probed at two trisecting positions between the source and drain electrode, which exactly corresponds to characteristic transistor events, such as carrier injection, carrier accumulation, pinch-off formation, and drain current saturation. Furthermore, a simple numerical calculation based on the gradual channel approximation and the current continuity equation reveals that the channel voltages have a non-linear potential distribution and an intrinsic but significant potential drop in the region near to the drain electrode in most of the linear regime.

Typ des Eintrags: Artikel
Erschienen: 2012
Autor(en): Okamura, Koshi ; Hahn, Horst
Art des Eintrags: Bibliographie
Titel: Potential distribution in channel of thin-film transistors
Sprache: Englisch
Publikationsjahr: 2012
Verlag: AIP Publishing LLC
Titel der Zeitschrift, Zeitung oder Schriftenreihe: Applied Physics Letters
Jahrgang/Volume einer Zeitschrift: 101
(Heft-)Nummer: 1
DOI: 10.1063/1.4733290
Kurzbeschreibung (Abstract):

Channel voltages of ZnO thin-film transistors during operation are precisely probed at two trisecting positions between the source and drain electrode, which exactly corresponds to characteristic transistor events, such as carrier injection, carrier accumulation, pinch-off formation, and drain current saturation. Furthermore, a simple numerical calculation based on the gradual channel approximation and the current continuity equation reveals that the channel voltages have a non-linear potential distribution and an intrinsic but significant potential drop in the region near to the drain electrode in most of the linear regime.

Fachbereich(e)/-gebiet(e): 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Gemeinschaftslabor Nanomaterialien
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft
11 Fachbereich Material- und Geowissenschaften
Hinterlegungsdatum: 17 Jun 2014 11:02
Letzte Änderung: 17 Jun 2014 11:02
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