Huang, Cheng ; Moosmann, Markus ; Jin, Jiehong ; Heiler, Tobias ; Walheim, Stefan ; Schimmel, Thomas (2012)
Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers.
In: Beilstein Journal of Nanotechnology, 3
doi: 10.3762/bjnano.3.71
Artikel, Bibliographie
Kurzbeschreibung (Abstract)
A rapid and cost-effective lithographic method, polymer blend lithography (PBL), is reported to produce patterned self-assembled monolayers (SAM) on solid substrates featuring two or three different chemical functionalities. For the pattern generation we use the phase separation of two immiscible polymers in a blend solution during a spin-coating process. By controlling the spin-coating parameters and conditions, including the ambient atmosphere (humidity), the molar mass of the polystyrene (PS) and poly(methyl methacrylate) (PMMA), and the mass ratio between the two polymers in the blend solution, the formation of a purely lateral morphology (PS islands standing on the substrate while isolated in the PMMA matrix) can be reproducibly induced. Either of the formed phases (PS or PMMA) can be selectively dissolved afterwards, and the remaining phase can be used as a lift-off mask for the formation of a nanopatterned functional silane monolayer. This “monolayer copy” of the polymer phase morphology has a topographic contrast of about 1.3 nm. A demonstration of tuning of the PS island diameter is given by changing the molar mass of PS. Moreover, polymer blend lithography can provide the possibility of fabricating a surface with three different chemical components: This is demonstrated by inducing breath figures (evaporated condensed entity) at higher humidity during the spin-coating process. Here we demonstrate the formation of a lateral pattern consisting of regions covered with 1H,1H,2H,2H-perfluorodecyltrichlorosilane (FDTS) and (3-aminopropyl)triethoxysilane (APTES), and at the same time featuring regions of bare SiOx. The patterning process could be applied even on meter-sized substrates with various functional SAM molecules, making this process suitable for the rapid preparation of quasi two-dimensional nanopatterned functional substrates, e.g., for the template-controlled growth of ZnO nanostructures.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2012 |
| Autor(en): | Huang, Cheng ; Moosmann, Markus ; Jin, Jiehong ; Heiler, Tobias ; Walheim, Stefan ; Schimmel, Thomas |
| Art des Eintrags: | Bibliographie |
| Titel: | Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers |
| Sprache: | Englisch |
| Publikationsjahr: | 4 September 2012 |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Beilstein Journal of Nanotechnology |
| Jahrgang/Volume einer Zeitschrift: | 3 |
| DOI: | 10.3762/bjnano.3.71 |
| Kurzbeschreibung (Abstract): | A rapid and cost-effective lithographic method, polymer blend lithography (PBL), is reported to produce patterned self-assembled monolayers (SAM) on solid substrates featuring two or three different chemical functionalities. For the pattern generation we use the phase separation of two immiscible polymers in a blend solution during a spin-coating process. By controlling the spin-coating parameters and conditions, including the ambient atmosphere (humidity), the molar mass of the polystyrene (PS) and poly(methyl methacrylate) (PMMA), and the mass ratio between the two polymers in the blend solution, the formation of a purely lateral morphology (PS islands standing on the substrate while isolated in the PMMA matrix) can be reproducibly induced. Either of the formed phases (PS or PMMA) can be selectively dissolved afterwards, and the remaining phase can be used as a lift-off mask for the formation of a nanopatterned functional silane monolayer. This “monolayer copy” of the polymer phase morphology has a topographic contrast of about 1.3 nm. A demonstration of tuning of the PS island diameter is given by changing the molar mass of PS. Moreover, polymer blend lithography can provide the possibility of fabricating a surface with three different chemical components: This is demonstrated by inducing breath figures (evaporated condensed entity) at higher humidity during the spin-coating process. Here we demonstrate the formation of a lateral pattern consisting of regions covered with 1H,1H,2H,2H-perfluorodecyltrichlorosilane (FDTS) and (3-aminopropyl)triethoxysilane (APTES), and at the same time featuring regions of bare SiOx. The patterning process could be applied even on meter-sized substrates with various functional SAM molecules, making this process suitable for the rapid preparation of quasi two-dimensional nanopatterned functional substrates, e.g., for the template-controlled growth of ZnO nanostructures. |
| Freie Schlagworte: | breath figure, nanopatterned template, polymer blend lithography (PBL), self-assembled monolayer (SAM), self assembly, spin coating, vapor phase |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Gemeinschaftslabor Nanomaterialien 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften |
| Hinterlegungsdatum: | 16 Jun 2014 11:49 |
| Letzte Änderung: | 16 Jun 2014 11:49 |
| PPN: | |
| Sponsoren: | This work was supported by the Deutsche Forschungsgemeinschaft (DFG) within the Center for Functional Nanostructures (CFN) and by the Baden-Württemberg Stiftung within the Network of Excellence “Functional Nanostructures”. |
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