TU Darmstadt / ULB / TUbiblio

The role of cationic and anionic point defects in pulsed laser deposition of perovskites

Alff, Lambert ; Komissinskiy, Philipp ; Radetinac, Aldin ; Sirman, Tanju ; Vafaee, Mehran :
The role of cationic and anionic point defects in pulsed laser deposition of perovskites.
[Online-Edition: http://dx.doi.org/10.1088/0022-3727/47/3/034012]
In: Journal of Physics D: Applied Physics, 47 (3) 034012. ISSN 0022-3727
[Artikel], (2014)

Offizielle URL: http://dx.doi.org/10.1088/0022-3727/47/3/034012

Kurzbeschreibung (Abstract)

Pulsed laser-deposited thin films often show properties that are less optimized compared to single crystalline materials, or thin films grown by molecular beam epitaxy. The main reasons include the high particle energies and the dynamics of the laser plasma. Furthermore, point defect engineering is difficult to achieve experimentally since the adjustable parameters show a complex interplay. Using the examples of the simple perovskite SrMoO3 and the double perovskite Sr2CrWO6 we discuss the role of cationic and anionic point defects, and how far they can be engineered during pulsed laser deposition.

Typ des Eintrags: Artikel
Erschienen: 2014
Autor(en): Alff, Lambert ; Komissinskiy, Philipp ; Radetinac, Aldin ; Sirman, Tanju ; Vafaee, Mehran
Titel: The role of cationic and anionic point defects in pulsed laser deposition of perovskites
Sprache: Englisch
Kurzbeschreibung (Abstract):

Pulsed laser-deposited thin films often show properties that are less optimized compared to single crystalline materials, or thin films grown by molecular beam epitaxy. The main reasons include the high particle energies and the dynamics of the laser plasma. Furthermore, point defect engineering is difficult to achieve experimentally since the adjustable parameters show a complex interplay. Using the examples of the simple perovskite SrMoO3 and the double perovskite Sr2CrWO6 we discuss the role of cationic and anionic point defects, and how far they can be engineered during pulsed laser deposition.

Titel der Zeitschrift, Zeitung oder Schriftenreihe: Journal of Physics D: Applied Physics
Band: 47
(Heft-)Nummer: 3
Verlag: IOP Publishing
Freie Schlagworte: Surfaces, interfaces, thin films
Fachbereich(e)/-gebiet(e): Fachbereich Material- und Geowissenschaften > Materialwissenschaften > Dünne Schichten, Advanced Thin Film Technology
Fachbereich Material- und Geowissenschaften > Materialwissenschaften
Fachbereich Material- und Geowissenschaften
Hinterlegungsdatum: 10 Jan 2014 11:21
Offizielle URL: http://dx.doi.org/10.1088/0022-3727/47/3/034012
ID-Nummer: 10.1088/0022-3727/47/3/034012
Export:

Optionen (nur für Redakteure)

Eintrag anzeigen Eintrag anzeigen