Zhu, Mingwei ; Komissinskiy, Philipp ; Radetinac, Aldin ; Vafaee, Mehran ; Wang, Zhanjie ; Alff, Lambert (2013)
Effect of composition and strain on the electrical properties of LaNiO3 thin films.
In: Applied Physics Letters, 103 (14)
doi: 10.1063/1.4823697
Artikel, Bibliographie
Kurzbeschreibung (Abstract)
The Ni content of LaNi1−xO3 epitaxial thin films grown by pulsed laser deposition has been varied by ablation from targets with different composition. While tensile strain and Ni substoichiometry reduce the conductivity, nearly stoichiometric and unstrained films show reproducibly resistivities below 100 μΩ × cm. Since the thermodynamic instability of the Ni 3+ state drives defect formation, Ni defect engineering is the key to obtain highly conducting LaNiO3 thin films.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2013 |
| Autor(en): | Zhu, Mingwei ; Komissinskiy, Philipp ; Radetinac, Aldin ; Vafaee, Mehran ; Wang, Zhanjie ; Alff, Lambert |
| Art des Eintrags: | Bibliographie |
| Titel: | Effect of composition and strain on the electrical properties of LaNiO3 thin films |
| Sprache: | Englisch |
| Publikationsjahr: | 2013 |
| Verlag: | AIP Publishing LLC |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Applied Physics Letters |
| Jahrgang/Volume einer Zeitschrift: | 103 |
| (Heft-)Nummer: | 14 |
| DOI: | 10.1063/1.4823697 |
| Kurzbeschreibung (Abstract): | The Ni content of LaNi1−xO3 epitaxial thin films grown by pulsed laser deposition has been varied by ablation from targets with different composition. While tensile strain and Ni substoichiometry reduce the conductivity, nearly stoichiometric and unstrained films show reproducibly resistivities below 100 μΩ × cm. Since the thermodynamic instability of the Ni 3+ state drives defect formation, Ni defect engineering is the key to obtain highly conducting LaNiO3 thin films. |
| Freie Schlagworte: | Nickel, Thin films, Thin film growth, electrical resistivity, Epitaxy, Vacancies, Temperature measurement, Charge carriers, Thin film structure, X-ray diffraction |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Dünne Schichten 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften |
| Hinterlegungsdatum: | 09 Jan 2014 09:14 |
| Letzte Änderung: | 09 Jan 2014 09:14 |
| PPN: | |
| Sponsoren: | This work was supported by the National Natural Science of Foundation of China (Nos. 51202256, 51172238), , the National Basic Research Program (No. 2010CB934603), the Ministry of Science and Technology of China, and by Deutsche Forschungsgemeinshaft (KO 4093/1-1), M. W. Zhu would like to thank China Scholarship Council (CSC) for the financial support of his scientific visit to Technical University of Darmstadt, Germany. |
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