Marin, E. ; Guzman, L. ; Lanzutti, A. ; Ensinger, Wolfgang ; Fedrizzi, L. (2012)
Multilayer Al2O3/TiO2 Atomic Layer Deposition coatings for the corrosion protection of stainless steel.
In: Thin Solid Films, 522 (0)
Artikel, Bibliographie
Kurzbeschreibung (Abstract)
Atomic Layer Deposition (ALD) is used to deposit conformal nanometric layers onto different substrates. In this paper, characterization of different ALD layers has been carried out in order to evaluate the suitability of this deposition technolnique for the corrosion protection of stainless steel substrates. Al2O3, TiO2 and multilayer configurations, have been deposited on AISI 316 austenitic stainless steel and have then been investigated using atomic force microscopy (AFM), glow discharge optical emission spectrometry (GDOES), scanning electron microscopy (SEM), Vickers indentation and potentiodynamic polarizations (PP). AFM has been used to obtain a morphological characterization and to evaluate the thickness of the depositions. SEM has been used to investigate the presence of deposition defects. GDOES has been used to obtain a compositional profile. Vickers indentations were used in order to evaluate the resistance to delamination. PPs have been used in order to evaluate the corrosion protection. The results have showed that corrosion resistance can be effectively enhanced. Multilayer configuration proved to be more effective than single layers configurations.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2012 |
| Autor(en): | Marin, E. ; Guzman, L. ; Lanzutti, A. ; Ensinger, Wolfgang ; Fedrizzi, L. |
| Art des Eintrags: | Bibliographie |
| Titel: | Multilayer Al2O3/TiO2 Atomic Layer Deposition coatings for the corrosion protection of stainless steel |
| Sprache: | Englisch |
| Publikationsjahr: | 1 November 2012 |
| Verlag: | Elsevier Science Publishing Company |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Thin Solid Films |
| Jahrgang/Volume einer Zeitschrift: | 522 |
| (Heft-)Nummer: | 0 |
| URL / URN: | http://www.sciencedirect.com/science/article/pii/S0040609012... |
| Kurzbeschreibung (Abstract): | Atomic Layer Deposition (ALD) is used to deposit conformal nanometric layers onto different substrates. In this paper, characterization of different ALD layers has been carried out in order to evaluate the suitability of this deposition technolnique for the corrosion protection of stainless steel substrates. Al2O3, TiO2 and multilayer configurations, have been deposited on AISI 316 austenitic stainless steel and have then been investigated using atomic force microscopy (AFM), glow discharge optical emission spectrometry (GDOES), scanning electron microscopy (SEM), Vickers indentation and potentiodynamic polarizations (PP). AFM has been used to obtain a morphological characterization and to evaluate the thickness of the depositions. SEM has been used to investigate the presence of deposition defects. GDOES has been used to obtain a compositional profile. Vickers indentations were used in order to evaluate the resistance to delamination. PPs have been used in order to evaluate the corrosion protection. The results have showed that corrosion resistance can be effectively enhanced. Multilayer configuration proved to be more effective than single layers configurations. |
| Freie Schlagworte: | AFM, AISI 316 stainless steel, Al2O3, ALD, Corrosion protection, GDOES, Polarization curves, TiO2 |
| Zusätzliche Informationen: | EMRS 2011 symp Q |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialanalytik 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften |
| Hinterlegungsdatum: | 19 Nov 2012 12:25 |
| Letzte Änderung: | 05 Mär 2013 10:03 |
| PPN: | |
| Export: | |
| Suche nach Titel in: | TUfind oder in Google |
 |
Frage zum Eintrag |
Optionen (nur für Redakteure)
 |
Redaktionelle Details anzeigen |
Drucken
Impressum