Lee, Y.-Y. ; Heck, C. ; Chayahara, A. ; Horino, Y. ; Ensinger, W. ; Enders, B. (2003)
Electrochemical porosity determination of thin protective films on iron base materials.
In: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 206
doi: 10.1016/S0168-583X(03)00843-7
Artikel, Bibliographie
Kurzbeschreibung (Abstract)
In this contribution we apply a recently developed technique to measure the porosity of thin films by means of an electrochemical method. As a model system thin iron films deposited on silicon wafers and coated with amorphous carbon protective films were chosen. The depositions were done with coaxial arc deposition. Rutherford backscattering spectroscopy, scanning electron microscopy and electrochemical measurements were carried out to characterize the films in dependence on deposition parameters and pre-cleaning procedures. Experiments show the validity of the introduced model. With the presented measurement technique it will be possible to study the dependence and control ability of thin films porosity by energetic ion bombardment during film growth. This is a relevant application for the corrosion properties of bulk materials coated with thin protective films which strongly depend on their porosity.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2003 |
| Autor(en): | Lee, Y.-Y. ; Heck, C. ; Chayahara, A. ; Horino, Y. ; Ensinger, W. ; Enders, B. |
| Art des Eintrags: | Bibliographie |
| Titel: | Electrochemical porosity determination of thin protective films on iron base materials |
| Sprache: | Englisch |
| Publikationsjahr: | Mai 2003 |
| Verlag: | Elsevier |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms |
| Jahrgang/Volume einer Zeitschrift: | 206 |
| DOI: | 10.1016/S0168-583X(03)00843-7 |
| Kurzbeschreibung (Abstract): | In this contribution we apply a recently developed technique to measure the porosity of thin films by means of an electrochemical method. As a model system thin iron films deposited on silicon wafers and coated with amorphous carbon protective films were chosen. The depositions were done with coaxial arc deposition. Rutherford backscattering spectroscopy, scanning electron microscopy and electrochemical measurements were carried out to characterize the films in dependence on deposition parameters and pre-cleaning procedures. Experiments show the validity of the introduced model. With the presented measurement technique it will be possible to study the dependence and control ability of thin films porosity by energetic ion bombardment during film growth. This is a relevant application for the corrosion properties of bulk materials coated with thin protective films which strongly depend on their porosity. |
| Freie Schlagworte: | Coaxial arc deposition, Modelling, Iron and carbon thin films |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialanalytik 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften |
| Hinterlegungsdatum: | 15 Nov 2012 09:41 |
| Letzte Änderung: | 05 Mär 2013 10:03 |
| PPN: | |
| Export: | |
| Suche nach Titel in: | TUfind oder in Google |
 |
Frage zum Eintrag |
Optionen (nur für Redakteure)
 |
Redaktionelle Details anzeigen |
Drucken
Impressum