Baba, Koumei and Hatada, Ruriko and Flege, Stefan and Ensinger, Wolfgang and Shibata, Y. and Nakashima, J. and Sawase, T. and Morimura, T. (2013):
Preparation and antibacterial properties of Ag-containing diamond-like carbon films prepared by a combination of magnetron sputtering and plasma source ion implantation.
In: Vacuum, 89, pp. 179-184. Elsevier, [Article]
Abstract
Ag-containing diamond-like carbon (DLC) films were prepared on austenitic type stainless steel SUS316L and silicon wafer substrates by a process combining reactive magnetron sputtering with plasma source ion implantation (PSII). An Ag disc was used as a target for the sputter source with an RF power of 100Â W. A mixture of the gases Ar and C2H2 was introduced into the discharge chamber while a negative high voltage pulse was applied to the substrate holder. By changing the gas flow ratios the resulting Ag content of the films could be varied. The prepared films were composed of amorphous carbon with crystalline Ag, as observed by X-ray diffractometry and TEM. Additional sample characterizations were performed by X-ray photoelectron spectroscopy, secondary ion mass spectrometry and Raman spectroscopy. The surface morphology was observed by scanning electron microscopy. The antibacterial activity was determined using Staphylococcus aureus bacteria. All Ag-containing diamond-like carbon films exhibited an antibacterial activity with only small variations depending on the Ag content.
Item Type: | Article |
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Erschienen: | 2013 |
Creators: | Baba, Koumei and Hatada, Ruriko and Flege, Stefan and Ensinger, Wolfgang and Shibata, Y. and Nakashima, J. and Sawase, T. and Morimura, T. |
Title: | Preparation and antibacterial properties of Ag-containing diamond-like carbon films prepared by a combination of magnetron sputtering and plasma source ion implantation |
Language: | English |
Abstract: | Ag-containing diamond-like carbon (DLC) films were prepared on austenitic type stainless steel SUS316L and silicon wafer substrates by a process combining reactive magnetron sputtering with plasma source ion implantation (PSII). An Ag disc was used as a target for the sputter source with an RF power of 100Â W. A mixture of the gases Ar and C2H2 was introduced into the discharge chamber while a negative high voltage pulse was applied to the substrate holder. By changing the gas flow ratios the resulting Ag content of the films could be varied. The prepared films were composed of amorphous carbon with crystalline Ag, as observed by X-ray diffractometry and TEM. Additional sample characterizations were performed by X-ray photoelectron spectroscopy, secondary ion mass spectrometry and Raman spectroscopy. The surface morphology was observed by scanning electron microscopy. The antibacterial activity was determined using Staphylococcus aureus bacteria. All Ag-containing diamond-like carbon films exhibited an antibacterial activity with only small variations depending on the Ag content. |
Journal or Publication Title: | Vacuum |
Journal volume: | 89 |
Publisher: | Elsevier |
Uncontrolled Keywords: | Antibacterial activity, DLC, Plasma source ion implantation, Silver |
Divisions: | 11 Department of Materials and Earth Sciences > Material Science > Material Analytics 11 Department of Materials and Earth Sciences > Material Science 11 Department of Materials and Earth Sciences |
Date Deposited: | 14 Nov 2012 13:48 |
Official URL: | http://www.sciencedirect.com/science/article/pii/S0042207X12... |
Additional Information: | Including rapid communications, original articles and a special section with papers from the Seventeenth International Conference on Surface Modification of Materials by Ion Beams (SMMIB), 13–17 September 2011, Harbin, China |
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