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Surface treatment of aluminum oxide and tungsten carbide powders by ion beam sputter deposition

Ensinger, W. and Müller, H. R. (2003):
Surface treatment of aluminum oxide and tungsten carbide powders by ion beam sputter deposition.
In: Surface and Coatings Technology, Elsevier, p. 281, 163, (163-164), ISSN 02578972, [Online-Edition: http://dx.doi.org/10.1016/S0257-8972(02)00490-5],
[Article]

Abstract

Alumina and tungsten carbide powder were coated with gold and platinum by ion beam sputter deposition. For uniform deposition, the powder grains were agitated in a rotating conical vessel. It contained a sputter target which was irradiated by a beam of rare gas ions. Metal atoms sputtered from the target were deposited onto the powders. The amount of deposited noble metals was determined by means of atomic absorption spectrometry. It increased monotonically with the sputter ion fluence. Under the given conditions, up to 0.3 wt.% gold were deposited onto alumina, while tungsten carbide received up to 0.016 wt.% platinum. While alumina remained non-conductive, the electrical conductivity of tungsten carbide was increased up to a factor 4 by platinum deposition. Electrochemical measurements showed that the electrochemical activity of tungsten carbide was considerably enhanced by platinum deposition. This material may be used as an electrocatalyst.

Item Type: Article
Erschienen: 2003
Creators: Ensinger, W. and Müller, H. R.
Title: Surface treatment of aluminum oxide and tungsten carbide powders by ion beam sputter deposition
Language: English
Abstract:

Alumina and tungsten carbide powder were coated with gold and platinum by ion beam sputter deposition. For uniform deposition, the powder grains were agitated in a rotating conical vessel. It contained a sputter target which was irradiated by a beam of rare gas ions. Metal atoms sputtered from the target were deposited onto the powders. The amount of deposited noble metals was determined by means of atomic absorption spectrometry. It increased monotonically with the sputter ion fluence. Under the given conditions, up to 0.3 wt.% gold were deposited onto alumina, while tungsten carbide received up to 0.016 wt.% platinum. While alumina remained non-conductive, the electrical conductivity of tungsten carbide was increased up to a factor 4 by platinum deposition. Electrochemical measurements showed that the electrochemical activity of tungsten carbide was considerably enhanced by platinum deposition. This material may be used as an electrocatalyst.

Journal or Publication Title: Surface and Coatings Technology
Volume: 163
Number: 163-164
Publisher: Elsevier
Uncontrolled Keywords: Aluminum oxide, Tungsten carbide, Ion beam sputtering, Electrocatalysis, Powder treatment
Divisions: 11 Department of Materials and Earth Sciences
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences > Material Science > Material Analytics
Date Deposited: 06 Sep 2012 08:32
Official URL: http://dx.doi.org/10.1016/S0257-8972(02)00490-5
Identification Number: doi:10.1016/S0257-8972(02)00490-5
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