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Surface treatment of aluminum oxide and tungsten carbide powders by ion beam sputter deposition

Ensinger, W. ; Müller, H. R. (2003)
Surface treatment of aluminum oxide and tungsten carbide powders by ion beam sputter deposition.
In: Surface and Coatings Technology, 163 (163-164)
doi: 10.1016/S0257-8972(02)00490-5
Artikel, Bibliographie

Kurzbeschreibung (Abstract)

Alumina and tungsten carbide powder were coated with gold and platinum by ion beam sputter deposition. For uniform deposition, the powder grains were agitated in a rotating conical vessel. It contained a sputter target which was irradiated by a beam of rare gas ions. Metal atoms sputtered from the target were deposited onto the powders. The amount of deposited noble metals was determined by means of atomic absorption spectrometry. It increased monotonically with the sputter ion fluence. Under the given conditions, up to 0.3 wt.% gold were deposited onto alumina, while tungsten carbide received up to 0.016 wt.% platinum. While alumina remained non-conductive, the electrical conductivity of tungsten carbide was increased up to a factor 4 by platinum deposition. Electrochemical measurements showed that the electrochemical activity of tungsten carbide was considerably enhanced by platinum deposition. This material may be used as an electrocatalyst.

Typ des Eintrags: Artikel
Erschienen: 2003
Autor(en): Ensinger, W. ; Müller, H. R.
Art des Eintrags: Bibliographie
Titel: Surface treatment of aluminum oxide and tungsten carbide powders by ion beam sputter deposition
Sprache: Englisch
Publikationsjahr: 30 Januar 2003
Verlag: Elsevier
Titel der Zeitschrift, Zeitung oder Schriftenreihe: Surface and Coatings Technology
Jahrgang/Volume einer Zeitschrift: 163
(Heft-)Nummer: 163-164
DOI: 10.1016/S0257-8972(02)00490-5
Kurzbeschreibung (Abstract):

Alumina and tungsten carbide powder were coated with gold and platinum by ion beam sputter deposition. For uniform deposition, the powder grains were agitated in a rotating conical vessel. It contained a sputter target which was irradiated by a beam of rare gas ions. Metal atoms sputtered from the target were deposited onto the powders. The amount of deposited noble metals was determined by means of atomic absorption spectrometry. It increased monotonically with the sputter ion fluence. Under the given conditions, up to 0.3 wt.% gold were deposited onto alumina, while tungsten carbide received up to 0.016 wt.% platinum. While alumina remained non-conductive, the electrical conductivity of tungsten carbide was increased up to a factor 4 by platinum deposition. Electrochemical measurements showed that the electrochemical activity of tungsten carbide was considerably enhanced by platinum deposition. This material may be used as an electrocatalyst.

Freie Schlagworte: Aluminum oxide, Tungsten carbide, Ion beam sputtering, Electrocatalysis, Powder treatment
Fachbereich(e)/-gebiet(e): 11 Fachbereich Material- und Geowissenschaften
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialanalytik
Hinterlegungsdatum: 06 Sep 2012 08:32
Letzte Änderung: 30 Aug 2018 12:47
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