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Development of Graded Low Friction SiCN Coatings with Extended High Temperature Stability above 1 200 °C

Hoche, Holger ; Allebrandt, Daniel ; Riedel, Ralf ; Fasel, Claudia (2009)
Development of Graded Low Friction SiCN Coatings with Extended High Temperature Stability above 1 200 °C.
In: Plasma Processes and Polymers, 6 (S1)
doi: 10.1002/ppap.200931709
Artikel, Bibliographie

Kurzbeschreibung (Abstract)

The authors developed a coating concept based on amorphous Si/C/N coatings, with promising high temperature properties. Due to a graded coating design, the adhesion, the coating hardness as well as the coefficient of friction were optimized. The coatings showed excellent high temperature stability against chemical decomposition, structural changes and surface oxidation up to 1 350 °C. To allow the deposition of coatings with a certain chemical composition, a numerical relationship between the composition of the coatings and the deposition parameters was established.

Typ des Eintrags: Artikel
Erschienen: 2009
Autor(en): Hoche, Holger ; Allebrandt, Daniel ; Riedel, Ralf ; Fasel, Claudia
Art des Eintrags: Bibliographie
Titel: Development of Graded Low Friction SiCN Coatings with Extended High Temperature Stability above 1 200 °C
Sprache: Englisch
Publikationsjahr: Juni 2009
Verlag: Wiley
Titel der Zeitschrift, Zeitung oder Schriftenreihe: Plasma Processes and Polymers
Jahrgang/Volume einer Zeitschrift: 6
(Heft-)Nummer: S1
DOI: 10.1002/ppap.200931709
Kurzbeschreibung (Abstract):

The authors developed a coating concept based on amorphous Si/C/N coatings, with promising high temperature properties. Due to a graded coating design, the adhesion, the coating hardness as well as the coefficient of friction were optimized. The coatings showed excellent high temperature stability against chemical decomposition, structural changes and surface oxidation up to 1 350 °C. To allow the deposition of coatings with a certain chemical composition, a numerical relationship between the composition of the coatings and the deposition parameters was established.

Freie Schlagworte: degradation, physical vapour deposition (PVD), SiCN, thermal properties
Fachbereich(e)/-gebiet(e): 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Disperse Feststoffe
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft
11 Fachbereich Material- und Geowissenschaften
Hinterlegungsdatum: 13 Apr 2012 10:47
Letzte Änderung: 05 Mär 2013 10:00
PPN:
Sponsoren: The authors acknowledge the financial support of the German Research Foundation (DFG), Project no. HO3315-5-1.
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