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Influence of the PVD sputtering method on structural characteristics of SiCN-coatings — Comparison of RF, DC and HiPIMS sputtering and target configurations

Pusch, Casper and Hoche, Holger and Berger, Christina and Riedel, Ralf and Ionescu, Emanuel and Klein, Andreas (2011):
Influence of the PVD sputtering method on structural characteristics of SiCN-coatings — Comparison of RF, DC and HiPIMS sputtering and target configurations.
In: Surface and Coatings Technology, 205 (Supplement 2), Elsevier, pp. S119-S123, ISSN 02578972,
[Online-Edition: http://dx.doi.org/10.1016/j.surfcoat.2011.04.095],
[Article]

Abstract

Si–C–N based materials exhibit promising properties such as excellent oxidation resistance and thermal stability even at temperatures above 1300 °C, thus making them promising candidates for high temperature applications. The properties of SiCN based coatings strongly depend upon the synthesis method and the synthesis parameters. In the present study, SiCN coatings were deposited by RF, DC and HiPIMS sputtering. Beyond this, the target configuration was varied for DC and HiPIMS sputtering. The coatings were characterized regarding their chemical, structural, mechanical and thermal properties. Since the SiCN coatings are amorphous, FT-IR and Raman spectroscopy as well as XPS were used to gather structural information. The structural and the thermal properties show a significant dependency on the sputtering method and target configuration, while the mechanical and chemical properties are only slightly affected.

Item Type: Article
Erschienen: 2011
Creators: Pusch, Casper and Hoche, Holger and Berger, Christina and Riedel, Ralf and Ionescu, Emanuel and Klein, Andreas
Title: Influence of the PVD sputtering method on structural characteristics of SiCN-coatings — Comparison of RF, DC and HiPIMS sputtering and target configurations
Language: English
Abstract:

Si–C–N based materials exhibit promising properties such as excellent oxidation resistance and thermal stability even at temperatures above 1300 °C, thus making them promising candidates for high temperature applications. The properties of SiCN based coatings strongly depend upon the synthesis method and the synthesis parameters. In the present study, SiCN coatings were deposited by RF, DC and HiPIMS sputtering. Beyond this, the target configuration was varied for DC and HiPIMS sputtering. The coatings were characterized regarding their chemical, structural, mechanical and thermal properties. Since the SiCN coatings are amorphous, FT-IR and Raman spectroscopy as well as XPS were used to gather structural information. The structural and the thermal properties show a significant dependency on the sputtering method and target configuration, while the mechanical and chemical properties are only slightly affected.

Journal or Publication Title: Surface and Coatings Technology
Volume: 205
Number: Supplement 2
Publisher: Elsevier
Uncontrolled Keywords: Physical vapour deposition (PVD), SiCN, Structural properties, Amorphous coatings
Divisions: 11 Department of Materials and Earth Sciences
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences > Material Science > Dispersive Solids
11 Department of Materials and Earth Sciences > Material Science > Surface Science
16 Department of Mechanical Engineering
16 Department of Mechanical Engineering > Center for Engineering Materials, State Materials Testing Institute Darmstadt (MPA) Chair and Institute for Materials Technology (IfW)
Date Deposited: 04 Apr 2012 10:55
Official URL: http://dx.doi.org/10.1016/j.surfcoat.2011.04.095
Identification Number: doi:10.1016/j.surfcoat.2011.04.095
Funders: Financial support of the German Research Foundation (DFG), Project No. HO3315/9-1.
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