Pusch, Casper ; Hoche, Holger ; Berger, Christina ; Riedel, Ralf ; Ionescu, Emanuel ; Klein, Andreas (2011)
Influence of the PVD sputtering method on structural characteristics of SiCN-coatings — Comparison of RF, DC and HiPIMS sputtering and target configurations.
In: Surface and Coatings Technology, 205 (Supplement 2)
doi: 10.1016/j.surfcoat.2011.04.095
Artikel, Bibliographie
Kurzbeschreibung (Abstract)
Si–C–N based materials exhibit promising properties such as excellent oxidation resistance and thermal stability even at temperatures above 1300 °C, thus making them promising candidates for high temperature applications. The properties of SiCN based coatings strongly depend upon the synthesis method and the synthesis parameters. In the present study, SiCN coatings were deposited by RF, DC and HiPIMS sputtering. Beyond this, the target configuration was varied for DC and HiPIMS sputtering. The coatings were characterized regarding their chemical, structural, mechanical and thermal properties. Since the SiCN coatings are amorphous, FT-IR and Raman spectroscopy as well as XPS were used to gather structural information. The structural and the thermal properties show a significant dependency on the sputtering method and target configuration, while the mechanical and chemical properties are only slightly affected.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2011 |
| Autor(en): | Pusch, Casper ; Hoche, Holger ; Berger, Christina ; Riedel, Ralf ; Ionescu, Emanuel ; Klein, Andreas |
| Art des Eintrags: | Bibliographie |
| Titel: | Influence of the PVD sputtering method on structural characteristics of SiCN-coatings — Comparison of RF, DC and HiPIMS sputtering and target configurations |
| Sprache: | Englisch |
| Publikationsjahr: | 25 Juli 2011 |
| Verlag: | Elsevier |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Surface and Coatings Technology |
| Jahrgang/Volume einer Zeitschrift: | 205 |
| (Heft-)Nummer: | Supplement 2 |
| DOI: | 10.1016/j.surfcoat.2011.04.095 |
| Kurzbeschreibung (Abstract): | Si–C–N based materials exhibit promising properties such as excellent oxidation resistance and thermal stability even at temperatures above 1300 °C, thus making them promising candidates for high temperature applications. The properties of SiCN based coatings strongly depend upon the synthesis method and the synthesis parameters. In the present study, SiCN coatings were deposited by RF, DC and HiPIMS sputtering. Beyond this, the target configuration was varied for DC and HiPIMS sputtering. The coatings were characterized regarding their chemical, structural, mechanical and thermal properties. Since the SiCN coatings are amorphous, FT-IR and Raman spectroscopy as well as XPS were used to gather structural information. The structural and the thermal properties show a significant dependency on the sputtering method and target configuration, while the mechanical and chemical properties are only slightly affected. |
| Freie Schlagworte: | Physical vapour deposition (PVD), SiCN, Structural properties, Amorphous coatings |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Disperse Feststoffe 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Oberflächenforschung 16 Fachbereich Maschinenbau 16 Fachbereich Maschinenbau > Fachgebiet und Institut für Werkstoffkunde - Zentrum für Konstruktionswerkstoffe - Staatliche Materialprüfungsanstalt Darmstadt (IfW-MPA) |
| Hinterlegungsdatum: | 04 Apr 2012 10:55 |
| Letzte Änderung: | 15 Jul 2015 09:22 |
| PPN: | |
| Sponsoren: | Financial support of the German Research Foundation (DFG), Project No. HO3315/9-1. |
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