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Modelling of boron nitride: Atomic scale simulations on thin film growth

Albe, K. ; Moller, W. (1998)
Modelling of boron nitride: Atomic scale simulations on thin film growth.
In: Comp. Mat. Sci., 10 (1-4)
doi: 10.1016/S0927-0256(97)00172-9
Artikel, Bibliographie

Kurzbeschreibung (Abstract)

Molecular-dynamics simulations on ion-beam deposition of boron nitride are presented. A realistic Tersoff-like potential energy functional for boron nitride, which was specially fitted to ab initio-data, has been used. The impact of energetic boron and nitrogen atoms on a c-BN target is simulated with energies ranging from 10 to 600 eV. The structural analysis of the grown films shows that a loose, dominantly sp(2)-bonded structure arises at high ion flux. In no case the formation of a sp(3)-bonded phase is observed, but the obtained films partially reveal textured basal planes as found in experiment. Two different growth regimes are identified for ion energies above and below 100 eV. Copyright (C) 1998 Elsevier Science B.V.

Typ des Eintrags: Artikel
Erschienen: 1998
Autor(en): Albe, K. ; Moller, W.
Art des Eintrags: Bibliographie
Titel: Modelling of boron nitride: Atomic scale simulations on thin film growth
Sprache: Englisch
Publikationsjahr: Februar 1998
Verlag: Elsevier
Titel der Zeitschrift, Zeitung oder Schriftenreihe: Comp. Mat. Sci.
Jahrgang/Volume einer Zeitschrift: 10
(Heft-)Nummer: 1-4
DOI: 10.1016/S0927-0256(97)00172-9
URL / URN: http://www.sciencedirect.com/science/article/pii/S0927025697...
Kurzbeschreibung (Abstract):

Molecular-dynamics simulations on ion-beam deposition of boron nitride are presented. A realistic Tersoff-like potential energy functional for boron nitride, which was specially fitted to ab initio-data, has been used. The impact of energetic boron and nitrogen atoms on a c-BN target is simulated with energies ranging from 10 to 600 eV. The structural analysis of the grown films shows that a loose, dominantly sp(2)-bonded structure arises at high ion flux. In no case the formation of a sp(3)-bonded phase is observed, but the obtained films partially reveal textured basal planes as found in experiment. Two different growth regimes are identified for ion energies above and below 100 eV. Copyright (C) 1998 Elsevier Science B.V.

Freie Schlagworte: Molecular dynamics, Boron nitride, Thin film growth
Fachbereich(e)/-gebiet(e): 11 Fachbereich Material- und Geowissenschaften
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialmodellierung
Hinterlegungsdatum: 28 Feb 2012 15:28
Letzte Änderung: 03 Jan 2019 15:20
PPN:
Sponsoren: This work has been supported by a project of “Sächsisches Ministerium für Wissenschaft und Kunst”.
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