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Ion beam smoothening of metal surfaces

Zhong, Y. and Ashkenazy, Y. and Albe, K. and Averback, R. S. (2003):
Ion beam smoothening of metal surfaces.
In: J. Appl. Phys., American Institute of Physics, pp. 4432-4439, 94, (7), [Online-Edition: http://jap.aip.org/resource/1/japiau/v94/i7/p4432_s1],
[Article]

Abstract

Ion beam induced smoothening of crystalline and amorphous substrates were investigated using molecular dynamics simulations. Rough surfaces created by depositing small nanoparticles, 2-3 nm in diameter, onto flat substrates were subjected to repeated impacts with 40 keV Xe atoms. Two smoothening processes are identified: The nanoparticle either burrows into the substrate, with the underlying substrate atoms flowing around it to the surface, or it flows over the substrate surface, wetting it. Generally, these two mechanisms operate simultaneously in both amorphous and crystalline substrates. The burrowing mechanism in amorphous substrates was additionally investigated by creating low energy recoils, 20 or 200 eV in the substrate beneath the nanoparticle. Roughening of initially smooth amorphous substrates during ion impact was also studied for comparison with the smoothening process. (C) 2003 American Institute of Physics.

Item Type: Article
Erschienen: 2003
Creators: Zhong, Y. and Ashkenazy, Y. and Albe, K. and Averback, R. S.
Title: Ion beam smoothening of metal surfaces
Language: English
Abstract:

Ion beam induced smoothening of crystalline and amorphous substrates were investigated using molecular dynamics simulations. Rough surfaces created by depositing small nanoparticles, 2-3 nm in diameter, onto flat substrates were subjected to repeated impacts with 40 keV Xe atoms. Two smoothening processes are identified: The nanoparticle either burrows into the substrate, with the underlying substrate atoms flowing around it to the surface, or it flows over the substrate surface, wetting it. Generally, these two mechanisms operate simultaneously in both amorphous and crystalline substrates. The burrowing mechanism in amorphous substrates was additionally investigated by creating low energy recoils, 20 or 200 eV in the substrate beneath the nanoparticle. Roughening of initially smooth amorphous substrates during ion impact was also studied for comparison with the smoothening process. (C) 2003 American Institute of Physics.

Journal or Publication Title: J. Appl. Phys.
Volume: 94
Number: 7
Publisher: American Institute of Physics
Uncontrolled Keywords: rough surfaces, ion beam effects, atom-surface impact, wetting, nanoparticles, substrates, amorphous state, molecular dynamics method, surface treatment
Divisions: 11 Department of Materials and Earth Sciences > Material Science > Materials Modelling
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences
Date Deposited: 22 Feb 2012 16:21
Official URL: http://jap.aip.org/resource/1/japiau/v94/i7/p4432_s1
Identification Number: doi:10.1063/1.1604933
Related URLs:
Funders: The research was supported in parts by the U.S. Department of Energy, Basic Energy Sciences under Grant No. DEFG02-91ER45439, the National Science Foundation, under Grant No. NSF-DMR-99-86160,, and the Center for Simulation of Advanced Rockets., Grants of computer time from the National Energy Research Supercomputer Center and the National Center for Supercomputing Applications are gratefully acknowledged.
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