Zhong, Y. ; Ashkenazy, Y. ; Albe, K. ; Averback, R. S. (2003)
Ion beam smoothening of metal surfaces.
In: J. Appl. Phys., 94 (7)
doi: 10.1063/1.1604933
Artikel, Bibliographie
Kurzbeschreibung (Abstract)
Ion beam induced smoothening of crystalline and amorphous substrates were investigated using molecular dynamics simulations. Rough surfaces created by depositing small nanoparticles, 2-3 nm in diameter, onto flat substrates were subjected to repeated impacts with 40 keV Xe atoms. Two smoothening processes are identified: The nanoparticle either burrows into the substrate, with the underlying substrate atoms flowing around it to the surface, or it flows over the substrate surface, wetting it. Generally, these two mechanisms operate simultaneously in both amorphous and crystalline substrates. The burrowing mechanism in amorphous substrates was additionally investigated by creating low energy recoils, 20 or 200 eV in the substrate beneath the nanoparticle. Roughening of initially smooth amorphous substrates during ion impact was also studied for comparison with the smoothening process. (C) 2003 American Institute of Physics.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2003 |
| Autor(en): | Zhong, Y. ; Ashkenazy, Y. ; Albe, K. ; Averback, R. S. |
| Art des Eintrags: | Bibliographie |
| Titel: | Ion beam smoothening of metal surfaces |
| Sprache: | Englisch |
| Publikationsjahr: | 1 Oktober 2003 |
| Verlag: | American Institute of Physics |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | J. Appl. Phys. |
| Jahrgang/Volume einer Zeitschrift: | 94 |
| (Heft-)Nummer: | 7 |
| DOI: | 10.1063/1.1604933 |
| URL / URN: | http://jap.aip.org/resource/1/japiau/v94/i7/p4432_s1 |
| Kurzbeschreibung (Abstract): | Ion beam induced smoothening of crystalline and amorphous substrates were investigated using molecular dynamics simulations. Rough surfaces created by depositing small nanoparticles, 2-3 nm in diameter, onto flat substrates were subjected to repeated impacts with 40 keV Xe atoms. Two smoothening processes are identified: The nanoparticle either burrows into the substrate, with the underlying substrate atoms flowing around it to the surface, or it flows over the substrate surface, wetting it. Generally, these two mechanisms operate simultaneously in both amorphous and crystalline substrates. The burrowing mechanism in amorphous substrates was additionally investigated by creating low energy recoils, 20 or 200 eV in the substrate beneath the nanoparticle. Roughening of initially smooth amorphous substrates during ion impact was also studied for comparison with the smoothening process. (C) 2003 American Institute of Physics. |
| Freie Schlagworte: | rough surfaces, ion beam effects, atom-surface impact, wetting, nanoparticles, substrates, amorphous state, molecular dynamics method, surface treatment |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialmodellierung 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften |
| Hinterlegungsdatum: | 22 Feb 2012 16:21 |
| Letzte Änderung: | 22 Mär 2016 13:23 |
| PPN: | |
| Sponsoren: | The research was supported in parts by the U.S. Department of Energy, Basic Energy Sciences under Grant No. DEFG02-91ER45439, the National Science Foundation, under Grant No. NSF-DMR-99-86160,, and the Center for Simulation of Advanced Rockets., Grants of computer time from the National Energy Research Supercomputer Center and the National Center for Supercomputing Applications are gratefully acknowledged. |
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