TU Darmstadt / ULB / TUbiblio

Role of copper interstitials in CuInSe2: First-principles calculations

Pohl, Johan ; Klein, Andreas ; Albe, Karsten (2011)
Role of copper interstitials in CuInSe2: First-principles calculations.
In: Physical Review B, 84 (12)
doi: 10.1103/PhysRevB.84.121201
Artikel, Bibliographie

Dies ist die neueste Version dieses Eintrags.

Kurzbeschreibung (Abstract)

Formation enthalpies and migration barriers of copper interstitials and Frenkel pairs in CuInSe2 (CIS) are determined by first-principles calculations within density functional theory using the nonlocal screened exchange Heyd-Scuseria-Ernzerhof (HSE06) functional. Interstitials occur on four symmetrically inequivalent sites with formation enthalpies of 0.17–0.38 eV, which are much lower than previously reported values based on local approximations. A direct interstitial and indirect interstitialcy diffusion mechanism with migration barriers as low as 0.22 and 0.34 eV are identified. The results provide evidence that the fast interstitial diffusion of copper is important for understanding metastabilities, Fermi-level pinning at interfaces, electric-field-induced creation of p-n junctions, and widely varying experimentally measured diffusion coefficients in CIS devices.

Typ des Eintrags: Artikel
Erschienen: 2011
Autor(en): Pohl, Johan ; Klein, Andreas ; Albe, Karsten
Art des Eintrags: Bibliographie
Titel: Role of copper interstitials in CuInSe2: First-principles calculations
Sprache: Englisch
Publikationsjahr: 8 September 2011
Titel der Zeitschrift, Zeitung oder Schriftenreihe: Physical Review B
Jahrgang/Volume einer Zeitschrift: 84
(Heft-)Nummer: 12
DOI: 10.1103/PhysRevB.84.121201
URL / URN: http://prb.aps.org/abstract/PRB/v84/i12/e121201
Zugehörige Links:
Kurzbeschreibung (Abstract):

Formation enthalpies and migration barriers of copper interstitials and Frenkel pairs in CuInSe2 (CIS) are determined by first-principles calculations within density functional theory using the nonlocal screened exchange Heyd-Scuseria-Ernzerhof (HSE06) functional. Interstitials occur on four symmetrically inequivalent sites with formation enthalpies of 0.17–0.38 eV, which are much lower than previously reported values based on local approximations. A direct interstitial and indirect interstitialcy diffusion mechanism with migration barriers as low as 0.22 and 0.34 eV are identified. The results provide evidence that the fast interstitial diffusion of copper is important for understanding metastabilities, Fermi-level pinning at interfaces, electric-field-induced creation of p-n junctions, and widely varying experimentally measured diffusion coefficients in CIS devices.

Fachbereich(e)/-gebiet(e): 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialmodellierung
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Oberflächenforschung
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft
11 Fachbereich Material- und Geowissenschaften
Hinterlegungsdatum: 21 Feb 2012 13:51
Letzte Änderung: 26 Mär 2015 10:04
PPN:
Sponsoren: We thank BMBF for funding this work under the GRACIS project, Grant No. 03SF0359E, and Jülich Supercomputing Center (JSC) for computing time.
Export:
Suche nach Titel in: TUfind oder in Google

Verfügbare Versionen dieses Eintrags

Frage zum Eintrag Frage zum Eintrag

Optionen (nur für Redakteure)
Redaktionelle Details anzeigen Redaktionelle Details anzeigen