Hatada, Ruriko ; Flege, Stefan ; Ensinger, Wolfgang ; Baba, Koumei (2011)
Comparison of the Surface Modification of Tungsten and Gold by Methane Plasma Source Ion Implantation.
In: IEEE Transactions on Plasma Science, 39 (11)
Artikel, Bibliographie
Kurzbeschreibung (Abstract)
On the basis of two substrate materials which possess similar atomic mass but different physical and chemical properties (e.g., sputtering yield and susceptibility for carbide formation), the treatment effects of methane plasma source ion implantation are compared. Tungsten and gold underwent implantation by the use of high voltage pulses of $-$20 kV in a methane atmosphere of 1 Pa. Differences in the formed surface structure, in implantation layer thickness and lateral distribution of the implanted species, and in surface properties such as friction coefficient and hardness are analyzed. The dependence of the surface modifications on the treatment conditions and on the substrate properties is described.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2011 |
| Autor(en): | Hatada, Ruriko ; Flege, Stefan ; Ensinger, Wolfgang ; Baba, Koumei |
| Art des Eintrags: | Bibliographie |
| Titel: | Comparison of the Surface Modification of Tungsten and Gold by Methane Plasma Source Ion Implantation |
| Sprache: | Englisch |
| Publikationsjahr: | 7 November 2011 |
| Verlag: | IEEE |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | IEEE Transactions on Plasma Science |
| Jahrgang/Volume einer Zeitschrift: | 39 |
| (Heft-)Nummer: | 11 |
| Kurzbeschreibung (Abstract): | On the basis of two substrate materials which possess similar atomic mass but different physical and chemical properties (e.g., sputtering yield and susceptibility for carbide formation), the treatment effects of methane plasma source ion implantation are compared. Tungsten and gold underwent implantation by the use of high voltage pulses of $-$20 kV in a methane atmosphere of 1 Pa. Differences in the formed surface structure, in implantation layer thickness and lateral distribution of the implanted species, and in surface properties such as friction coefficient and hardness are analyzed. The dependence of the surface modifications on the treatment conditions and on the substrate properties is described. |
| Freie Schlagworte: | carbon, gold, Ion implantation, plasma immersion ion implantation, plasma material processing, Sputtering, Substrates, Surface treatment, Tungsten |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialanalytik 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften |
| Hinterlegungsdatum: | 18 Nov 2011 13:41 |
| Letzte Änderung: | 05 Mär 2013 09:55 |
| PPN: | |
| Sponsoren: | Sponsored by IEEE Nuclear and Plasma Sciences Society |
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