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Comparison of the Surface Modification of Tungsten and Gold by Methane Plasma Source Ion Implantation

Hatada, Ruriko and Flege, Stefan and Ensinger, Wolfgang and Baba, Koumei (2011):
Comparison of the Surface Modification of Tungsten and Gold by Methane Plasma Source Ion Implantation.
In: IEEE Transactions on Plasma Science, IEEE, pp. 3080-3084, 39, (11), ISSN 0093-3813, [Article]

Abstract

On the basis of two substrate materials which possess similar atomic mass but different physical and chemical properties (e.g., sputtering yield and susceptibility for carbide formation), the treatment effects of methane plasma source ion implantation are compared. Tungsten and gold underwent implantation by the use of high voltage pulses of $-$20 kV in a methane atmosphere of 1 Pa. Differences in the formed surface structure, in implantation layer thickness and lateral distribution of the implanted species, and in surface properties such as friction coefficient and hardness are analyzed. The dependence of the surface modifications on the treatment conditions and on the substrate properties is described.

Item Type: Article
Erschienen: 2011
Creators: Hatada, Ruriko and Flege, Stefan and Ensinger, Wolfgang and Baba, Koumei
Title: Comparison of the Surface Modification of Tungsten and Gold by Methane Plasma Source Ion Implantation
Language: English
Abstract:

On the basis of two substrate materials which possess similar atomic mass but different physical and chemical properties (e.g., sputtering yield and susceptibility for carbide formation), the treatment effects of methane plasma source ion implantation are compared. Tungsten and gold underwent implantation by the use of high voltage pulses of $-$20 kV in a methane atmosphere of 1 Pa. Differences in the formed surface structure, in implantation layer thickness and lateral distribution of the implanted species, and in surface properties such as friction coefficient and hardness are analyzed. The dependence of the surface modifications on the treatment conditions and on the substrate properties is described.

Journal or Publication Title: IEEE Transactions on Plasma Science
Volume: 39
Number: 11
Publisher: IEEE
Uncontrolled Keywords: carbon, gold, Ion implantation, plasma immersion ion implantation, plasma material processing, Sputtering, Substrates, Surface treatment, Tungsten
Divisions: 11 Department of Materials and Earth Sciences > Material Science > Material Analytics
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences
Date Deposited: 18 Nov 2011 13:41
Funders: Sponsored by IEEE Nuclear and Plasma Sciences Society
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