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Methane plasma-based ion implantation of metallic and galvanically oxidized tantalum

Flege, Stefan and Baba, Koumei and Hatada, Ruriko and Ensinger, Wolfgang (2011):
Methane plasma-based ion implantation of metallic and galvanically oxidized tantalum.
In: Surface and Coatings Technology, Elsevier Science Publishing Company, pp. 951-954, 206, (5), [Online-Edition: http://www.sciencedirect.com/science/article/pii/S0257897211...],
[Article]

Abstract

Tantalum and oxidized tantalum exhibit distinct differences when treated with plasma-based ion implantation of methane with − 20 kV. The implantation profiles of carbon are similar, but carbides are formed in the case of tantalum, as verified with X-ray diffraction and X-ray photoelectron spectrometry in combination with depth profiling, whereas there is no detectable carbide in the tantalum oxide film. The distributions of the co-implanted hydrogen also vary in that the intensity in depth profiling with secondary ion mass spectrometry does steadily decrease in the oxidized Ta, while in the metallic Ta it shows a short indentation below the surface and then decreases only very slowly.

Item Type: Article
Erschienen: 2011
Creators: Flege, Stefan and Baba, Koumei and Hatada, Ruriko and Ensinger, Wolfgang
Title: Methane plasma-based ion implantation of metallic and galvanically oxidized tantalum
Language: English
Abstract:

Tantalum and oxidized tantalum exhibit distinct differences when treated with plasma-based ion implantation of methane with − 20 kV. The implantation profiles of carbon are similar, but carbides are formed in the case of tantalum, as verified with X-ray diffraction and X-ray photoelectron spectrometry in combination with depth profiling, whereas there is no detectable carbide in the tantalum oxide film. The distributions of the co-implanted hydrogen also vary in that the intensity in depth profiling with secondary ion mass spectrometry does steadily decrease in the oxidized Ta, while in the metallic Ta it shows a short indentation below the surface and then decreases only very slowly.

Journal or Publication Title: Surface and Coatings Technology
Volume: 206
Number: 5
Publisher: Elsevier Science Publishing Company
Uncontrolled Keywords: Carbide, Methane plasma, Plasma based ion implantation, Secondary ion mass spectrometry, Tantalum
Divisions: 11 Department of Materials and Earth Sciences > Material Science > Material Analytics
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences
Date Deposited: 18 Nov 2011 13:43
Official URL: http://www.sciencedirect.com/science/article/pii/S0257897211...
Additional Information:

Surface Modification of Materials by Ion beams 2009 — SMMIB 2009

Proceedings of the 16th International Conference on Surface Modification of Materials by Ion Beams

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