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Superconducting, structural and surface properties of GdBaCuO thin films deposited by electron cyclotron resonance supported sputtering

Krupke, Ralph (1997)
Superconducting, structural and surface properties of GdBaCuO thin films deposited by electron cyclotron resonance supported sputtering.
In: Physica C: Superconductivity, 279 (3-4)
doi: 10.1016/S0921-4534(97)00120-2
Artikel, Bibliographie

Kurzbeschreibung (Abstract)

Thin films of GdBaCuO have been deposited in off-axis geometry by electron cyclotron resonance (ECR) supported DC sputtering at 2.45 GHz in an oxygen-argon mixture at a total pressure of 10−1 mbar. Using this technique the target voltage could be varied over a wide range from −40 to −200 V without influencing the plasma generation. The deposition characteristics of the sputtering device were investigated in detail for GdBa2Cu3O7 and pure Cu targets. The superconducting and structural properties of the films and their surface morphologies were determined as a function of substrate temperature, composition, total pressure and target voltage. Optimum preparation conditions were low target voltages between −40 and −75 V, an oxygen partial pressure ranging from 10−4 to 3 × 10−4 mbar and a copper content slightly above stoichiometry. At these conditions the films grew with pure c-axis orientation at comparably low substrate temperatures between 650C and 680C. They showed superconducting transition temperatures between 91 K and 92 K, critical current densities of 4 × 106 A/cm2 (77 K, zero field), surface resistances of 1.9 Mω at 18.75 GHz and 77 K, and an average surface roughness of 2.5 nm. 0 1997 Elsevier Science B.V.

Typ des Eintrags: Artikel
Erschienen: 1997
Autor(en): Krupke, Ralph
Art des Eintrags: Bibliographie
Titel: Superconducting, structural and surface properties of GdBaCuO thin films deposited by electron cyclotron resonance supported sputtering
Sprache: Englisch
Publikationsjahr: 1 Juni 1997
Titel der Zeitschrift, Zeitung oder Schriftenreihe: Physica C: Superconductivity
Jahrgang/Volume einer Zeitschrift: 279
(Heft-)Nummer: 3-4
DOI: 10.1016/S0921-4534(97)00120-2
Kurzbeschreibung (Abstract):

Thin films of GdBaCuO have been deposited in off-axis geometry by electron cyclotron resonance (ECR) supported DC sputtering at 2.45 GHz in an oxygen-argon mixture at a total pressure of 10−1 mbar. Using this technique the target voltage could be varied over a wide range from −40 to −200 V without influencing the plasma generation. The deposition characteristics of the sputtering device were investigated in detail for GdBa2Cu3O7 and pure Cu targets. The superconducting and structural properties of the films and their surface morphologies were determined as a function of substrate temperature, composition, total pressure and target voltage. Optimum preparation conditions were low target voltages between −40 and −75 V, an oxygen partial pressure ranging from 10−4 to 3 × 10−4 mbar and a copper content slightly above stoichiometry. At these conditions the films grew with pure c-axis orientation at comparably low substrate temperatures between 650C and 680C. They showed superconducting transition temperatures between 91 K and 92 K, critical current densities of 4 × 106 A/cm2 (77 K, zero field), surface resistances of 1.9 Mω at 18.75 GHz and 77 K, and an average surface roughness of 2.5 nm. 0 1997 Elsevier Science B.V.

Freie Schlagworte: Thin films; ECR sputter-deposition; Phase diagram; Defect structures
Fachbereich(e)/-gebiet(e): 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Molekulare Nanostrukturen
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft
11 Fachbereich Material- und Geowissenschaften
Hinterlegungsdatum: 08 Nov 2011 14:22
Letzte Änderung: 05 Mär 2013 09:55
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