Krupke, Ralph ; Malik, S. ; Weber, H. B. ; Hampe, O. ; Kappes, M. M. ; Löhneysen, Hilbert v. (2002)
Patterning and Visualizing Self-Assembled Monolayers with Low-Energy Electrons.
In: Nano Letters, 2 (10)
doi: 10.1021/nl025679e
Artikel, Bibliographie
Kurzbeschreibung (Abstract)
We show that a trimethylsilyl (TMS) self-assembled monolayer on a silicon surface is a self-developing positive resist, which can be patterned with low energy electrons. Contact angle measurements have been used to quantify the efficiency of the exposure as a function of exposure dose and acceleration voltage. Ash formation was negligible, as a 3-aminopropyltriethoxysilane (APTES) self-assembled monolayer could be formed on the patterned area without an intermediate development stage. APTES/TMS patterns have been visualized with scanning electron microscopy at low energy and atomic force microscopy. The functionality of the patterns has been tested by selective deposition of carbon nanotubes.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2002 |
| Autor(en): | Krupke, Ralph ; Malik, S. ; Weber, H. B. ; Hampe, O. ; Kappes, M. M. ; Löhneysen, Hilbert v. |
| Art des Eintrags: | Bibliographie |
| Titel: | Patterning and Visualizing Self-Assembled Monolayers with Low-Energy Electrons |
| Sprache: | Englisch |
| Publikationsjahr: | 18 September 2002 |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Nano Letters |
| Jahrgang/Volume einer Zeitschrift: | 2 |
| (Heft-)Nummer: | 10 |
| DOI: | 10.1021/nl025679e |
| Kurzbeschreibung (Abstract): | We show that a trimethylsilyl (TMS) self-assembled monolayer on a silicon surface is a self-developing positive resist, which can be patterned with low energy electrons. Contact angle measurements have been used to quantify the efficiency of the exposure as a function of exposure dose and acceleration voltage. Ash formation was negligible, as a 3-aminopropyltriethoxysilane (APTES) self-assembled monolayer could be formed on the patterned area without an intermediate development stage. APTES/TMS patterns have been visualized with scanning electron microscopy at low energy and atomic force microscopy. The functionality of the patterns has been tested by selective deposition of carbon nanotubes. |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Molekulare Nanostrukturen 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften |
| Hinterlegungsdatum: | 08 Nov 2011 13:52 |
| Letzte Änderung: | 05 Mär 2013 09:55 |
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