Drogowska, K. ; Kim-Ngan, N.-T. H. ; Balogh, A. G. ; Radecka, M. ; Brudnik, A. ; Zakrzewska, K. ; Tarnawski, Z. (2010)
Diffusion and chemical composition of TiNxOy thin films studied by Rutherford Backscattering Spectroscopy.
In: Surface Science, 604 (11-12)
Artikel, Bibliographie
Kurzbeschreibung (Abstract)
Thickness and chemical composition of the TiNxOy thin films deposited by reactive magnetron sputtering from Ti target at controllable oxygen flow rate were determined by Rutherford Backscattering Spectroscopy (RBS) using 2 MeV He+ ions. The films were deposited on carbon foils and amorphous silica (a-SiO2) substrates at 25 °C and 250 °C. The estimated film thickness is of 75-100 nm. The O/Ti atomic ratio in the films increases up to 1.5 with increasing oxygen flow rate, while that of N/Ti decreases from about 1.1 for TiN to 0.4 at the highest oxygen flow rate. Substantial out-diffusion of carbon from the substrate is observed which is independent of the substrate temperature. Films grown onto a-SiO2 substrates can be treated as homogeneous single layers without interdiffusion. It is more difficult to determine the nitrogen and oxygen content due to superposition of RBS signals arising from film and substrate. RBS analysis of the depth profile indicates that for the investigated films the carbon diffusion and oxidation not only at the topmost surface layers but over the bulk of the films were found. Comparison with XPS results indicates substantial oxygen adsorption at the surface of TiNx thin films obtained at zero oxygen flow rate.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2010 |
| Autor(en): | Drogowska, K. ; Kim-Ngan, N.-T. H. ; Balogh, A. G. ; Radecka, M. ; Brudnik, A. ; Zakrzewska, K. ; Tarnawski, Z. |
| Art des Eintrags: | Bibliographie |
| Titel: | Diffusion and chemical composition of TiNxOy thin films studied by Rutherford Backscattering Spectroscopy |
| Sprache: | Englisch |
| Publikationsjahr: | 15 Juni 2010 |
| Verlag: | Elsevier Science Publishing Company |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Surface Science |
| Jahrgang/Volume einer Zeitschrift: | 604 |
| (Heft-)Nummer: | 11-12 |
| URL / URN: | http://www.sciencedirect.com/science/article/B6TVX-4YM7FDB-1... |
| Kurzbeschreibung (Abstract): | Thickness and chemical composition of the TiNxOy thin films deposited by reactive magnetron sputtering from Ti target at controllable oxygen flow rate were determined by Rutherford Backscattering Spectroscopy (RBS) using 2 MeV He+ ions. The films were deposited on carbon foils and amorphous silica (a-SiO2) substrates at 25 °C and 250 °C. The estimated film thickness is of 75-100 nm. The O/Ti atomic ratio in the films increases up to 1.5 with increasing oxygen flow rate, while that of N/Ti decreases from about 1.1 for TiN to 0.4 at the highest oxygen flow rate. Substantial out-diffusion of carbon from the substrate is observed which is independent of the substrate temperature. Films grown onto a-SiO2 substrates can be treated as homogeneous single layers without interdiffusion. It is more difficult to determine the nitrogen and oxygen content due to superposition of RBS signals arising from film and substrate. RBS analysis of the depth profile indicates that for the investigated films the carbon diffusion and oxidation not only at the topmost surface layers but over the bulk of the films were found. Comparison with XPS results indicates substantial oxygen adsorption at the surface of TiNx thin films obtained at zero oxygen flow rate. |
| Freie Schlagworte: | Oxide surfaces; Sputtering; RBS |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialanalytik 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften |
| Hinterlegungsdatum: | 09 Jul 2010 10:40 |
| Letzte Änderung: | 05 Mär 2013 09:35 |
| PPN: | |
| Sponsoren: | The authors highly acknowledge the financial support by Foundation for Polish Science MPD Programme co-financed by the EU European Regional Development Fund, DAAD project D/08/07729, MNiSW project Nr 651/N-DAAD/2010/0, (DFG) SFB-595 project, and project NN 515 080637 for science in 2009–2012. |
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