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Microphase separation transition and ordering kinetics in thin films of diblock copolymers

Mutter, R. ; Stühn, B. :
Microphase separation transition and ordering kinetics in thin films of diblock copolymers.
In: Colloid and Polymer science, 273 (7) pp. 653-660.
[Artikel], (1995)

Kurzbeschreibung (Abstract)

Using x-ray reflectivity measurements, we have investigated the structure of films of a symmetric diblock copolymer of polystyrene-b-polyisoprene (M(w) = 15 700). The film thickness is in the range of 1 mu m. In equilibrium the films consist of lamellae with a thickness of 15.3 nm. They are nearly completely oriented parallel to the substrate. The evolution of oriented structure is studied by time-dependent experiments. The time constants of the structure formation depend strongly on the annealing temperature. An enhancement of the diffuse intensity in the range of Yoneda scattering is evidence for an additional surface structure.

Typ des Eintrags: Artikel
Erschienen: 1995
Autor(en): Mutter, R. ; Stühn, B.
Titel: Microphase separation transition and ordering kinetics in thin films of diblock copolymers
Sprache: Englisch
Kurzbeschreibung (Abstract):

Using x-ray reflectivity measurements, we have investigated the structure of films of a symmetric diblock copolymer of polystyrene-b-polyisoprene (M(w) = 15 700). The film thickness is in the range of 1 mu m. In equilibrium the films consist of lamellae with a thickness of 15.3 nm. They are nearly completely oriented parallel to the substrate. The evolution of oriented structure is studied by time-dependent experiments. The time constants of the structure formation depend strongly on the annealing temperature. An enhancement of the diffuse intensity in the range of Yoneda scattering is evidence for an additional surface structure.

Titel der Zeitschrift, Zeitung oder Schriftenreihe: Colloid and Polymer science
Band: 273
(Heft-)Nummer: 7
Fachbereich(e)/-gebiet(e): Fachbereich Physik
Fachbereich Physik > Festkörperphysik, Condensed matter physics
Hinterlegungsdatum: 26 Feb 2010 14:18
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