TU Darmstadt / ULB / TUbiblio

Speciation of BCxNy films grown by PECVD with trimethylborazine precursor

Baake, Olaf and Hoffmann, Peter and Klein, Andreas and Pollakowski, Beatrix and Beckhoff, Burkhard and Kosinova, Marina and Fainer, Nadeshda and Sulyaeva, Veronica and Trunova, Valentina and Ensinger, Wolfgang (2009):
Speciation of BCxNy films grown by PECVD with trimethylborazine precursor.
In: Analytical and Bioanalytical Chemistry, Springer-Verlag, pp. 1901-1909, 395, (6), ISSN 1618-2642,
[Online-Edition: http://dx.doi.org/10.1007/s00216-009-3056-6],
[Article]

Abstract

Films of BC x N y were produced in a plasma-enhanced chemical vapor deposition process using trimethylborazine as precursor and with H2, He, N2, and NH3, respectively, as auxiliary gas. These films deposited on Si(100) wafers or fused quartz glass substrates were characterized chemically by X-ray photoelectron spectroscopy and by synchrotron radiation-based total-reflection X-ray fluorescence combined with near-edge X-ray absorption fine structure. Independent of the auxiliary gas, the B–N bonds are dominating. Furthermore, B–C and N–C bonds were identified. Oxygen, present in the bulk (in contrast to the surface layer of some nanometers, where molecular oxygen and/or water are absorbed) as an impurity, is bonded to boron or to carbon, respectively. The relation of boron and nitrogen changes with the character of the auxiliary gas: c B/c N ≈ 4:3 (for H2 and He) and c B/c N ≈ 1 (for N2 or NH3). Furthermore, physical properties such as the refractive index and the optical band-gap energy were determined.

Item Type: Article
Erschienen: 2009
Creators: Baake, Olaf and Hoffmann, Peter and Klein, Andreas and Pollakowski, Beatrix and Beckhoff, Burkhard and Kosinova, Marina and Fainer, Nadeshda and Sulyaeva, Veronica and Trunova, Valentina and Ensinger, Wolfgang
Title: Speciation of BCxNy films grown by PECVD with trimethylborazine precursor
Language: English
Abstract:

Films of BC x N y were produced in a plasma-enhanced chemical vapor deposition process using trimethylborazine as precursor and with H2, He, N2, and NH3, respectively, as auxiliary gas. These films deposited on Si(100) wafers or fused quartz glass substrates were characterized chemically by X-ray photoelectron spectroscopy and by synchrotron radiation-based total-reflection X-ray fluorescence combined with near-edge X-ray absorption fine structure. Independent of the auxiliary gas, the B–N bonds are dominating. Furthermore, B–C and N–C bonds were identified. Oxygen, present in the bulk (in contrast to the surface layer of some nanometers, where molecular oxygen and/or water are absorbed) as an impurity, is bonded to boron or to carbon, respectively. The relation of boron and nitrogen changes with the character of the auxiliary gas: c B/c N ≈ 4:3 (for H2 and He) and c B/c N ≈ 1 (for N2 or NH3). Furthermore, physical properties such as the refractive index and the optical band-gap energy were determined.

Journal or Publication Title: Analytical and Bioanalytical Chemistry
Volume: 395
Number: 6
Publisher: Springer-Verlag
Uncontrolled Keywords: Boron carbonitride; Synthesis; PECVD; XPS; NEXAFS
Divisions: 11 Department of Materials and Earth Sciences > Material Science > Material Analytics
11 Department of Materials and Earth Sciences > Material Science > Surface Science
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences
Date Deposited: 16 Nov 2009 16:57
Official URL: http://dx.doi.org/10.1007/s00216-009-3056-6
Identification Number: doi:10.1007/s00216-009-3056-6
Funders: The authors acknowledge the financial support granted by the Deutsche Forschungsgemeinschaft for the research projects “nanolayer speciation” (EN 207/22-1, BE 1372/2-1) and “chemical and physical characterization of nanolayers” (EN 207/22-2, BE 1372/2-2)., The authors of the Russian Federation thank RFBR for the grant 07-03-91555-NNIO.
Export:
Suche nach Titel in: TUfind oder in Google

Optionen (nur für Redakteure)

View Item View Item