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Speciation of BCxNy films grown by PECVD with trimethylborazine precursor

Baake, Olaf ; Hoffmann, Peter ; Klein, Andreas ; Pollakowski, Beatrix ; Beckhoff, Burkhard ; Kosinova, Marina ; Fainer, Nadeshda ; Sulyaeva, Veronica ; Trunova, Valentina ; Ensinger, Wolfgang (2009)
Speciation of BCxNy films grown by PECVD with trimethylborazine precursor.
In: Analytical and Bioanalytical Chemistry, 395 (6)
doi: 10.1007/s00216-009-3056-6
Artikel, Bibliographie

Kurzbeschreibung (Abstract)

Films of BC x N y were produced in a plasma-enhanced chemical vapor deposition process using trimethylborazine as precursor and with H2, He, N2, and NH3, respectively, as auxiliary gas. These films deposited on Si(100) wafers or fused quartz glass substrates were characterized chemically by X-ray photoelectron spectroscopy and by synchrotron radiation-based total-reflection X-ray fluorescence combined with near-edge X-ray absorption fine structure. Independent of the auxiliary gas, the B–N bonds are dominating. Furthermore, B–C and N–C bonds were identified. Oxygen, present in the bulk (in contrast to the surface layer of some nanometers, where molecular oxygen and/or water are absorbed) as an impurity, is bonded to boron or to carbon, respectively. The relation of boron and nitrogen changes with the character of the auxiliary gas: c B/c N ≈ 4:3 (for H2 and He) and c B/c N ≈ 1 (for N2 or NH3). Furthermore, physical properties such as the refractive index and the optical band-gap energy were determined.

Typ des Eintrags: Artikel
Erschienen: 2009
Autor(en): Baake, Olaf ; Hoffmann, Peter ; Klein, Andreas ; Pollakowski, Beatrix ; Beckhoff, Burkhard ; Kosinova, Marina ; Fainer, Nadeshda ; Sulyaeva, Veronica ; Trunova, Valentina ; Ensinger, Wolfgang
Art des Eintrags: Bibliographie
Titel: Speciation of BCxNy films grown by PECVD with trimethylborazine precursor
Sprache: Englisch
Publikationsjahr: November 2009
Verlag: Springer-Verlag
Titel der Zeitschrift, Zeitung oder Schriftenreihe: Analytical and Bioanalytical Chemistry
Jahrgang/Volume einer Zeitschrift: 395
(Heft-)Nummer: 6
DOI: 10.1007/s00216-009-3056-6
Kurzbeschreibung (Abstract):

Films of BC x N y were produced in a plasma-enhanced chemical vapor deposition process using trimethylborazine as precursor and with H2, He, N2, and NH3, respectively, as auxiliary gas. These films deposited on Si(100) wafers or fused quartz glass substrates were characterized chemically by X-ray photoelectron spectroscopy and by synchrotron radiation-based total-reflection X-ray fluorescence combined with near-edge X-ray absorption fine structure. Independent of the auxiliary gas, the B–N bonds are dominating. Furthermore, B–C and N–C bonds were identified. Oxygen, present in the bulk (in contrast to the surface layer of some nanometers, where molecular oxygen and/or water are absorbed) as an impurity, is bonded to boron or to carbon, respectively. The relation of boron and nitrogen changes with the character of the auxiliary gas: c B/c N ≈ 4:3 (for H2 and He) and c B/c N ≈ 1 (for N2 or NH3). Furthermore, physical properties such as the refractive index and the optical band-gap energy were determined.

Freie Schlagworte: Boron carbonitride; Synthesis; PECVD; XPS; NEXAFS
Fachbereich(e)/-gebiet(e): 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialanalytik
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Oberflächenforschung
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft
11 Fachbereich Material- und Geowissenschaften
Hinterlegungsdatum: 16 Nov 2009 16:57
Letzte Änderung: 25 Mär 2015 21:28
PPN:
Sponsoren: The authors acknowledge the financial support granted by the Deutsche Forschungsgemeinschaft for the research projects “nanolayer speciation” (EN 207/22-1, BE 1372/2-1) and “chemical and physical characterization of nanolayers” (EN 207/22-2, BE 1372/2-2)., The authors of the Russian Federation thank RFBR for the grant 07-03-91555-NNIO.
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