TU Darmstadt / ULB / TUbiblio

Ion beam assisted deposition of nitrogen-containing chromium films: A comparison of argon vs nitrogen ions

Ensinger, Wolfgang and Kiuchi, M. :
Ion beam assisted deposition of nitrogen-containing chromium films: A comparison of argon vs nitrogen ions.
[Online-Edition: http://www.sciencedirect.com/science/article/B6TVV-4VT0WYP-1...]
In: Surface and Coatings Technology, 203 (17-18) pp. 2763-2766.
[Article] , (2009)

Official URL: http://www.sciencedirect.com/science/article/B6TVV-4VT0WYP-1...

Abstract

Chromium films were deposited onto different substrates by two ion beam assisted deposition techniques, one being based on nitrogen ion implantation, the other one being based on nitrogen gas sorption under rare gas ion irradiation. In both cases, a residual gas atmosphere of nitrogen was used. In the first case, nitrogen was both implanted and absorbed from the atmosphere, in the second case, it was only absorbed under the influence of rare gas ion irradiation. In dependence on ion irradiation intensity, the films consist of phase mixtures of nitrogen-containing chromium, di-chromium nitride and chromium nitride. Nitrogen content of the films is a function of both ionic species and ion irradiation intensity. In case of nitrogen irradiation, always more nitrogen is incorporated than for the argon ion case. Under moderate ion irradiation, the surface morphology of the films is almost the same for both, under intense irradiation, argon ion bombardment leads to larger grains.

Item Type: Article
Erschienen: 2009
Creators: Ensinger, Wolfgang and Kiuchi, M.
Title: Ion beam assisted deposition of nitrogen-containing chromium films: A comparison of argon vs nitrogen ions
Language: English
Abstract:

Chromium films were deposited onto different substrates by two ion beam assisted deposition techniques, one being based on nitrogen ion implantation, the other one being based on nitrogen gas sorption under rare gas ion irradiation. In both cases, a residual gas atmosphere of nitrogen was used. In the first case, nitrogen was both implanted and absorbed from the atmosphere, in the second case, it was only absorbed under the influence of rare gas ion irradiation. In dependence on ion irradiation intensity, the films consist of phase mixtures of nitrogen-containing chromium, di-chromium nitride and chromium nitride. Nitrogen content of the films is a function of both ionic species and ion irradiation intensity. In case of nitrogen irradiation, always more nitrogen is incorporated than for the argon ion case. Under moderate ion irradiation, the surface morphology of the films is almost the same for both, under intense irradiation, argon ion bombardment leads to larger grains.

Journal or Publication Title: Surface and Coatings Technology
Volume: 203
Number: 17-18
Publisher: Elsevier Science Publishing Company
Uncontrolled Keywords: Chromium nitride, Dynamic ion beam mixing, Ion beam assisted deposition (IBAD), Scanning tunneling microscopy
Divisions: 11 Department of Materials and Earth Sciences > Material Science > Material Analytics
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences
Date Deposited: 15 Jul 2009 12:51
Official URL: http://www.sciencedirect.com/science/article/B6TVV-4VT0WYP-1...
Export:

Optionen (nur für Redakteure)

View Item View Item