Baake, O. ; Hoffmann, P. S. ; Klein, Andreas ; Pollakowski, B. ; Beckhoff, B. ; Ensinger, W. ; Kosinova, M. ; Fainer, N. ; Sulyaeva, V. S. ; Trunova, V. (2009)
Chemical character of BCxNy layers grown by CVD with trimethylamine borane.
In: X-Ray Spectrometry, 38 (1)
doi: 10.1002/xrs.1117
Artikel, Bibliographie
Kurzbeschreibung (Abstract)
Layers of BCxNy were produced in a chemical vapour deposition (CVD) process using trimethylamine borane with He, N2, and NH3, respectively, as precursor. These layers deposited on Si (100) wafers were characterized chemically by X-ray photoelectron spectroscopy (XPS) and synchrotron radiation-based total reflection X-ray fluorescence analysis combined with near-edge X-ray absorption fine structure spectroscopy (TXRF-NEXAFS). As a result, the composition of the material produced without NH3 is a B-C bonds containing compound with an atomic relation 1:1. Adding NH3 with a partial pressure of up to about 1.3 Pa the product could be identified as B2C2N. Increasing the partial pressure of NH3 to 1.7 and 2.1 Pa the product was enriched in nitrogen yielding a compound characterized as h-BCN. In all cases an impurity of oxygen was observed.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2009 |
| Autor(en): | Baake, O. ; Hoffmann, P. S. ; Klein, Andreas ; Pollakowski, B. ; Beckhoff, B. ; Ensinger, W. ; Kosinova, M. ; Fainer, N. ; Sulyaeva, V. S. ; Trunova, V. |
| Art des Eintrags: | Bibliographie |
| Titel: | Chemical character of BCxNy layers grown by CVD with trimethylamine borane |
| Sprache: | Englisch |
| Publikationsjahr: | Januar 2009 |
| Verlag: | WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | X-Ray Spectrometry |
| Jahrgang/Volume einer Zeitschrift: | 38 |
| (Heft-)Nummer: | 1 |
| DOI: | 10.1002/xrs.1117 |
| Kurzbeschreibung (Abstract): | Layers of BCxNy were produced in a chemical vapour deposition (CVD) process using trimethylamine borane with He, N2, and NH3, respectively, as precursor. These layers deposited on Si (100) wafers were characterized chemically by X-ray photoelectron spectroscopy (XPS) and synchrotron radiation-based total reflection X-ray fluorescence analysis combined with near-edge X-ray absorption fine structure spectroscopy (TXRF-NEXAFS). As a result, the composition of the material produced without NH3 is a B-C bonds containing compound with an atomic relation 1:1. Adding NH3 with a partial pressure of up to about 1.3 Pa the product could be identified as B2C2N. Increasing the partial pressure of NH3 to 1.7 and 2.1 Pa the product was enriched in nitrogen yielding a compound characterized as h-BCN. In all cases an impurity of oxygen was observed. |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialanalytik 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Oberflächenforschung 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften |
| Hinterlegungsdatum: | 15 Jul 2009 12:43 |
| Letzte Änderung: | 25 Mär 2015 21:29 |
| PPN: | |
| Sponsoren: | Funded by DeutscheForschungsgemeinschaft |
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